Arrays Of Recessed Access Devices, Methods Of Forming Recessed Access Gate Constructions, And Methods Of Forming Isolation Gate Constructions In The Fabrication Of Recessed Access Devices
First Claim
1. A method of forming an array of recessed access device gate constructions, comprising:
- using the width of an anisotropically etched sidewall spacer in forming mask openings in an etch mask for forming all recessed access device trenches within semiconductor material within all of the array;
using the etch mask while etching all of the recessed access device trenches into the semiconductor material within all of the array through the mask openings; and
forming individual recessed access gate constructions in the individual recessed access device trenches.
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Accused Products
Abstract
A method of forming an array of recessed access device gate constructions includes using the width of an anisotropically etched sidewall spacer in forming mask openings in an etch mask for forming all recessed access device trenches within semiconductor material within all of the array. The etch mask is used while etching all of the recessed access device trenches into the semiconductor material within all of the array through the mask openings. Individual recessed access gate constructions are formed in the individual recessed access device trenches. Other methods are contemplated, including arrays of recessed access devices independent of method of manufacture.
36 Citations
33 Claims
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1. A method of forming an array of recessed access device gate constructions, comprising:
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using the width of an anisotropically etched sidewall spacer in forming mask openings in an etch mask for forming all recessed access device trenches within semiconductor material within all of the array; using the etch mask while etching all of the recessed access device trenches into the semiconductor material within all of the array through the mask openings; and forming individual recessed access gate constructions in the individual recessed access device trenches. - View Dependent Claims (2, 3)
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4. A method of forming an array of recessed access device gate constructions and isolation gate constructions, comprising:
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using the width of an anisotropically etched sidewall spacer in forming first mask openings in an etch mask for forming all recessed access device trenches within semiconductor material within all of the array; using space between anisotropically etched sidewall spacers in forming second mask openings in the etch mask for forming isolation trenches within the semiconductor material within the array; using the etch mask while simultaneously etching the isolation trenches into the semiconductor material within the array through the second mask openings and all of the recessed access device trenches into the semiconductor material within all of the array through the first mask openings, the isolation trenches being formed deeper into the semiconductor material than are the recessed access device trenches; and forming individual isolation gate constructions in the individual isolation trenches and individual recessed access gate constructions in the individual recessed access device trenches. - View Dependent Claims (5, 6)
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7. A method of forming an array of isolation gate constructions in the fabrication of recessed access devices, comprising:
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using space between anisotropically etched sidewall spacers in forming mask openings in an etch mask for forming all isolation trenches within the semiconductor material within all of the array; using the etch mask while etching all of the isolation trenches into the semiconductor material within all of the array through the mask openings; and forming individual isolation gate constructions in the individual isolation trenches. - View Dependent Claims (8, 9)
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10. A method of forming an array of recessed access device gate constructions and isolation gate constructions, comprising:
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using the width of an anisotropically etched sidewall spacer in forming mask openings in an etch mask for forming recessed access device trenches within semiconductor material within the array; using space between anisotropically etched sidewall spacers in forming second mask openings in the etch mask for forming all isolation trenches within the semiconductor material within all of the array; using the etch mask while simultaneously etching the recessed access device trenches into the semiconductor material within the array through the first mask openings and all of the isolation trenches into the semiconductor material within all of the array through the second mask openings;
the isolation trenches being formed deeper into the semiconductor material than are the recessed access device trenches; andforming individual isolation gate constructions in the individual isolation trenches and individual recessed access gate constructions in the individual recessed access device trenches. - View Dependent Claims (11)
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12. A method of forming an array of recessed access device gate constructions and isolation gate constructions, comprising:
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forming spaced first features over semiconductor material, the first features comprising spaced first sets of immediately adjacent first features, the immediately adjacent first features within individual first sets being closer to one another than spacing between immediately adjacent first sets; forming masking material over opposing lateral sidewalls of the first features, the masking material spanning completely between immediately adjacent first features within the first sets, the masking material not spanning completely between immediately adjacent first sets; removing the first features from between the masking material and forming spaced second features, the second features comprising spaced second sets of immediately adjacent second features, the immediately adjacent second features within individual second sets being closer to one another than spacing between immediately adjacent second sets; simultaneously etching isolation trenches and recessed access device trenches into the semiconductor material using the second sets as a mask, the recessed access device trenches being formed through mask openings between immediately adjacent second features within the second sets, the isolation trenches being formed through mask openings between the second sets and being formed deeper into the semiconductor material than are the recessed access device trenches; and forming individual isolation gate constructions in the individual isolation trenches and individual recessed access gate constructions in the individual recessed access device trenches. - View Dependent Claims (13, 14, 15, 16, 17)
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18. A method of forming an array of recessed access device gate constructions and isolation gate constructions, comprising:
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forming an initial feature pattern in a first hard-mask, the initial feature pattern comprising blocks for forming recessed access device trenches within semiconductor material within the array; forming spacer material over sidewalls of the blocks; removing the blocks from between the spacer material to form a subsequent feature pattern comprising first mask openings for forming the recessed access device trenches within semiconductor material within the array and comprising second mask openings for forming isolation trenches within the semiconductor material within the array; transferring the subsequent feature pattern to a second hard-mask overlying the semiconductor material; using the second hard-mask comprising the transferred feature pattern in simultaneously etching the recessed access device trenches and the isolation trenches into the semiconductor material within the array; and forming individual isolation gate constructions in the individual isolation trenches and individual recessed access gate constructions in the individual recessed access device trenches. - View Dependent Claims (19, 20, 21, 22)
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23. An array of recessed access devices, comprising:
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a plurality of isolation gate constructions within isolation trenches formed in semiconductor material; at least two recessed access device gate constructions individually within individual gate trenches formed in the semiconductor material between immediately adjacent the isolation gate constructions; source/drain regions between the recessed access device gate constructions and between the isolation gate constructions and the recessed access device gate constructions; and the recessed access device gate constructions individually comprising a conductive gate having an elevationally outermost conductive surface, the elevationally outermost conductive surfaces of all of the recessed access device gate constructions within all of the array relative one another being within no greater than 50 Angstroms of elevational thickness of the semiconductor material. - View Dependent Claims (24, 25, 26)
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27. An array of recessed access devices, comprising:
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a plurality of isolation gate constructions within isolation trenches formed in semiconductor material; at least two recessed access device gate constructions individually within individual gate trenches formed in the semiconductor material between immediately adjacent the isolation gate constructions; source/drain regions between the recessed access device gate constructions and between the isolation gate constructions and the recessed access device gate constructions; and the isolation gate constructions individually comprising an elevationally innermost surface, the elevationally innermost surfaces of all of the isolation gate constructions within all of the array relative one another being within no greater than 40 Angstroms of elevational thickness of the semiconductor material. - View Dependent Claims (28, 29, 30, 31, 32, 33)
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Specification