OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MICROLITHOGRAPHIC EXPOSURE METHOD
First Claim
1. An optical system having a pupil plane, the optical comprising:
- a mirror arrangement comprising a plurality of mirror elements which are displaceable independently of each other to alter an angular distribution of light reflected by the mirror arrangement during use of the optical system; and
a manipulator downstream of the mirror arrangement along a light propagation path through the optical system, the manipulator comprising a raster arrangement of manipulator elements configured so that light interacting with the manipulator during use of the optical system is influenced differently in its polarization state and/or in its intensity depending on an incidence location of the light on the manipulator,wherein;
when the mirror elements are arranged in a first configuration, light reflected by the mirror arrangement results in a first illumination setting in the pupil plane;
when the mirror elements are arranged in a second configuration, light reflected by the mirror arrangement results in a second illumination setting in the pupil plane;
the first and second illumination settings illuminate identical regions of the pupil plane;
a polarization state of the light in the pupil plane in the first illumination setting is different from a polarization state of the light in the pupil plane in the second illumination setting;
the raster arrangement of manipulator elements has an arrangement of regions which differently influence the polarization state and/or the intensity of light that interacts with the manipulator elements;
the arrangement of regions alternates periodically in two perpendicular spatial directions;
a period length of the periodically alternating arrangement in a given spatial direction corresponds to a period length of the mirror arrangement in that spatial direction or to an integral multiple of the period length in that spatial direction; and
the optical system is configured to be used in a microlithographic projection exposure apparatus.
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Accused Products
Abstract
An optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method are disclosed. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes at least one manipulator downstream of the mirror arrangement in the light propagation direction. The manipulator has a raster arrangement of manipulator elements so that light incident on the manipulator during operation of the optical system is influenced differently in its polarization state and/or in its intensity in dependence on the incidence location.
20 Citations
30 Claims
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1. An optical system having a pupil plane, the optical comprising:
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a mirror arrangement comprising a plurality of mirror elements which are displaceable independently of each other to alter an angular distribution of light reflected by the mirror arrangement during use of the optical system; and a manipulator downstream of the mirror arrangement along a light propagation path through the optical system, the manipulator comprising a raster arrangement of manipulator elements configured so that light interacting with the manipulator during use of the optical system is influenced differently in its polarization state and/or in its intensity depending on an incidence location of the light on the manipulator, wherein; when the mirror elements are arranged in a first configuration, light reflected by the mirror arrangement results in a first illumination setting in the pupil plane; when the mirror elements are arranged in a second configuration, light reflected by the mirror arrangement results in a second illumination setting in the pupil plane; the first and second illumination settings illuminate identical regions of the pupil plane; a polarization state of the light in the pupil plane in the first illumination setting is different from a polarization state of the light in the pupil plane in the second illumination setting; the raster arrangement of manipulator elements has an arrangement of regions which differently influence the polarization state and/or the intensity of light that interacts with the manipulator elements; the arrangement of regions alternates periodically in two perpendicular spatial directions; a period length of the periodically alternating arrangement in a given spatial direction corresponds to a period length of the mirror arrangement in that spatial direction or to an integral multiple of the period length in that spatial direction; and the optical system is configured to be used in a microlithographic projection exposure apparatus. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 16, 17, 18, 19, 20, 21)
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22. An optical system, comprising:
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a mirror arrangement comprising a plurality of mirror elements which are displaceable independently of each other to alter an angular distribution of light reflected by the mirror arrangement during use of the optical system; and a manipulator comprising a raster arrangement of manipulator elements so that light interacting with the manipulator during use of the optical system is influenced differently in its polarization state depending on an incidence location of the light on the manipulator, wherein at least one of the manipulator elements comprises a Kerr cell or a Pockels cell, and the optical system is configured to be used in a microlithographic projection exposure apparatus. - View Dependent Claims (23, 24, 25, 26)
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27. An optical system, comprising:
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a manipulator configured so that light interacting with the manipulator during use of the optical system is influenced differently in its polarization state and/or in its intensity depending on an incidence location of the light on the manipulator; and first and second mirror arrangements, each mirror arrangement comprising a plurality of mirror elements which are displaceable independently of each other to alter an angular distribution of light reflected by the mirror arrangement, wherein the manipulator is between the first and second mirror arrangements along a light propagation path through the optical system.
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28. A method of operating a microlithograpic projection exposure apparatus comprising an illumination system and a projection objective, the illumination setting comprising a manipulator comprising a raster arrangement of manipulator elements, the method comprising:
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interacting light with a first region of the manipulator elements to provide a first illumination setting in a pupil plane of the illumination system; and interacting light with a second region of the manipulator elements to provide a second illumination setting in the pupil plane of the illumination system, wherein the first region of the manipulator elements differs from the second region of the manipulator elements, and the first illumination setting in the pupil plane differs from the second illumination setting in the pupil plane. - View Dependent Claims (29, 30)
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Specification