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METHOD FOR FORMING DIFFUSION REGIONS IN A SILICON SUBSTRATE

  • US 20130081687A1
  • Filed: 09/30/2011
  • Published: 04/04/2013
  • Est. Priority Date: 09/30/2011
  • Status: Active Grant
First Claim
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1. ) A method of manufacturing solar cells, the method comprising:

  • depositing an etch-resistant dopant material on a silicon substrate, the etch-resistant dopant material comprising a dopant source;

    forming a cross-linked matrix in the etch-resistant dopant material using a non-thermal cure of the etch-resistant dopant material; and

    heating the silicon substrate and the etch-resistant dopant material to a temperature sufficient to cause the dopant source to diffuse into the silicon substrate.

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