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Plasma Tuning Rods in Microwave Resonator Plasma Sources

  • US 20130082030A1
  • Filed: 09/30/2011
  • Published: 04/04/2013
  • Est. Priority Date: 09/30/2011
  • Status: Active Grant
First Claim
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1. A microwave processing system for processing a substrate comprising:

  • a rectangular process chamber comprising a process space having a substrate holder therein;

    a first resonator assembly coupled to the rectangular process chamber using a first interface assembly, the first resonator assembly having an electromagnetic (EM) energy tuning space therein, the first interface assembly including a first set of isolation assemblies, wherein a first set of EM-coupling regions are established in the EM-energy tuning space;

    a first set of plasma-tuning rods coupled to the first set of isolation assemblies, the first set of plasma-tuning rods having first plasma-tuning portions configured to control plasma uniformity in the process space and first EM-tuning portions configured in the EM-energy tuning space and coupled to at least one of the first set of EM-coupling regions;

    a resonator sensor coupled to the EM-energy tuning space, the resonator sensor being configured to obtain resonator data; and

    a controller coupled to the first set of isolation assemblies and the resonator sensor, wherein the controller is configured to control the first set of plasma-tuning rods using the first set of isolation assemblies and the resonator data, thereby controlling the first set of EM-coupling regions in the first EM-energy tuning space and the plasma uniformity in the process space.

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