GROUP III-NITRIDE METAL-INSULATOR-SEMICONDUCTOR HETEROSTRUCTURE FIELD-EFFECT TRANSISTORS
First Claim
1. An apparatus comprising:
- a buffer layer formed on a substrate;
a barrier layer formed on the buffer layer, the barrier layer including aluminum (Al), nitrogen (N), and at least one of indium (In) or gallium (Ga);
a cap layer formed on the barrier layer, the cap layer including nitrogen (N) and at least one of indium (In) or gallium (Ga); and
a gate formed on the cap layer, the gate being directly coupled with the cap layer.
1 Assignment
0 Petitions
Accused Products
Abstract
Embodiments of the present disclosure describe apparatuses, methods, and systems of an integrated circuit (IC) device such as, for example, a high electron mobility transistor (HEMT) or metal-insulator-semiconductor field-effect transistor (MISFET), or combinations thereof. The IC device includes a buffer layer formed on a substrate, a barrier layer formed on the buffer layer, the barrier layer including aluminum (Al), nitrogen (N), and at least one of indium (In) and gallium (Ga), a cap layer formed on the barrier layer, the cap layer including nitrogen (N) and at least one of indium (In) and gallium (Ga), and a gate formed on the cap layer, the gate being directly coupled with the cap layer. Other embodiments may also be described and/or claimed.
37 Citations
20 Claims
-
1. An apparatus comprising:
-
a buffer layer formed on a substrate; a barrier layer formed on the buffer layer, the barrier layer including aluminum (Al), nitrogen (N), and at least one of indium (In) or gallium (Ga); a cap layer formed on the barrier layer, the cap layer including nitrogen (N) and at least one of indium (In) or gallium (Ga); and a gate formed on the cap layer, the gate being directly coupled with the cap layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
-
-
15. A method comprising:
-
forming a buffer layer on a substrate; forming a barrier layer on the buffer layer, the barrier layer including aluminum (Al), nitrogen (N), and at least one of indium (In) or gallium (Ga); forming a cap layer on the barrier layer, the cap layer including nitrogen (N) and at least one of indium (In) or gallium (Ga); and forming a gate on the cap layer, the gate being directly coupled with the cap layer. - View Dependent Claims (16, 17, 18, 19, 20)
-
Specification