HEAT TREATMENT APPARATUS

• US 20130112669A1
• Filed: 01/20/2012
• Published: 05/09/2013
• Est. Priority Date: 11/08/2011
• Status: Abandoned Application

• Current Assignee: Hitachi High-Technologies Corporation (Hitachi, Ltd.)
• Original Assignee: Takashi Uemura
• Inventors: Yokogawa, Kenetsu, Miyake, Masatoshi, Izawa, Masaru, Sakai, Satoshi, UEMURA, Takashi
• Application Number:
  US13/354,358
• Publication Number:
  US 20130112669A1
• Time in Patent Office: Days
• US Class Current: 219/121.36
• CPC Class Codes: H01J 37/32082 Radio frequency generated discharge H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence

Abstract

The present invention provides a heat treatment apparatus which can reduce a surface roughing of a processed substrate while keeping a heat efficiency high, even in the case of heating a sample to be heated to 1200° C. or higher. The present invention is a heat treatment apparatus carrying out a heat treatment of a sample to be heated, wherein a plasma generated by a glow electric discharge is used as a heating source, and the sample to be heated is indirectly heated.

Claims

1. A heat treatment apparatus comprising:

a heating treatment chamber for heating a sample to be heated;

a heating plate for heating the sample to be heated and disposed in said heating treatment chamber;

a plate electrode disposed in said heating treatment chamber and being opposed to said heating plate;

a radio-frequency power supply supplying a radio-frequency power to said plate electrode and generating a plasma between said plate electrode and said heating plate; and

a sample stage supporting the sample to be heated and being disposed below to said heating plate.

2. The heat treatment apparatus as claimed in claim 1, wherein said heating plate comprises:

a member being circular plate; and

a beam provided in outer periphery of the member and supporting the member.

3. The heat treatment apparatus as claimed in claim 2,

further comprising a reflection mirror reflecting radiation heat, wherein said heating plate is conducted with the reflection mirror via the beam.

4. The heat treatment apparatus as claimed in claim 3, wherein said heating plate is grounded via the reflection mirror.

5. The heat treatment apparatus as claimed in claim 1, wherein said sample stage comprises radiation heat suppressing means.

6. The heat treatment apparatus as claimed in claim 5, wherein the radiation heat suppressing means is constructed by a sheet material which has a high melting point and a low radiation rate or a coating which has a high melting point and a low radiation rate.

7. The heat treatment apparatus as claimed in claim 5, wherein said heating plate comprises:

a member being a circular plate; and

a beam provided in an outer periphery of said member and supporting said member.

8. The heat treatment apparatus as claimed in claim 7,

further comprising a reflection mirror reflecting radiation heat, wherein said heating plate is conducted with said reflection mirror via said beam.

9. The heat treatment apparatus as claimed in claim 8, wherein said heating plate is grounded via said reflection mirror.

10. The heat treatment apparatus as claimed in claim 1, wherein said sample stage has a graphite substrate.