Lithographic fabrication process for a pressure sensor
First Claim
1. A method of lithographically fabricating a pressure sensor, the method comprising the steps of:
- providing a first wafer substrate having first and second opposing planar surfaces;
depositing circuitry on the first planar surface;
depositing a layer of passivation material on the circuitry;
etching openings in the passivation layer to expose parts of the circuitry;
etching an aperture through the first wafer to fluidically connect the exposed parts of the circuitry and the second planar surface;
depositing sacrificial material in the aperture;
depositing a flexible membrane on the sacrificial material and the exposed parts of the circuitry;
plasma cleaning the sacrificial material out of the aperture from the second surface;
providing a second substrate; and
,sealing the second substrate to the second planar surface of the first wafer substrate to define a chamber containing a fluid at a reference pressure;
wherein during use, the flexible membrane deflects due to pressure differentials between the reference pressure and an external fluid pressure to be sensed such that the circuitry converts the deflection of the flexible membrane into an output signal indicative of the external fluid pressure.
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Accused Products
Abstract
Lithographic fabrication of a pressure sensor (30) for environments such as vehicle tires is described. The sensor has a first wafer substrate (32) with first and second planar surfaces on opposing sides. CMOS circuitry (34) is deposited on the first planar surface. A layer of passivation material is deposited on the circuitry. Etched openings in the passivation layer expose parts of the circuitry and an aperture is etched through the first wafer to fluidically connect the exposed circuitry with the second planar surface. Sacrificial material is deposited in the aperture and then a flexible membrane (50) is deposited on the sacrificial material and the exposed parts of the circuitry. The sacrificial material is subsequently etched from the aperture from the second surface. A second substrate is sealed to the second planar surface of the first wafer substrate to define a chamber (58) containing a fluid at a reference pressure.
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Citations
18 Claims
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1. A method of lithographically fabricating a pressure sensor, the method comprising the steps of:
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providing a first wafer substrate having first and second opposing planar surfaces; depositing circuitry on the first planar surface; depositing a layer of passivation material on the circuitry; etching openings in the passivation layer to expose parts of the circuitry; etching an aperture through the first wafer to fluidically connect the exposed parts of the circuitry and the second planar surface; depositing sacrificial material in the aperture; depositing a flexible membrane on the sacrificial material and the exposed parts of the circuitry; plasma cleaning the sacrificial material out of the aperture from the second surface; providing a second substrate; and
,sealing the second substrate to the second planar surface of the first wafer substrate to define a chamber containing a fluid at a reference pressure;
wherein during use, the flexible membrane deflects due to pressure differentials between the reference pressure and an external fluid pressure to be sensed such that the circuitry converts the deflection of the flexible membrane into an output signal indicative of the external fluid pressure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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Specification