SUBSTRATE PROCESSING SYSTEM AND METHOD
First Claim
1. A substrate processing system, comprising:
- a processing chamber defining a processing zone;
a first chuck array coupled to a first transport mechanism positioned on a first side, wherein the first chuck array is configured to be linearly movable back and forth on the first transport mechanism;
a second chuck array coupled to a second transport mechanism positioned on a second side, opposite the first side, wherein the second chuck array is configured to be linearly movable back and forth on the second transport mechanism;
and wherein each of the first and second transport mechanism is configured to be movable in elevation direction to enable one of the first and second chuck arrays to pass below the other one of the first and second chuck arrays.
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Accused Products
Abstract
A system for processing substrates has a vacuum enclosure and a processing chamber situated to process wafers in a processing zone inside the vacuum enclosure. Two rail assemblies are provided, one on each side of the processing zone. Two chuck arrays ride, each on one of the rail assemblies, such that each is cantilevered on one rail assemblies and support a plurality of chucks. The rail assemblies are coupled to an elevation mechanism that places the rails in upper position for processing and at lower position for returning the chuck assemblies for loading new wafers. A pickup head assembly loads wafers from a conveyor onto the chuck assemblies. The pickup head has plurality of electrostatic chucks that pick up the wafers from the front side of the wafers. Cooling channels in the processing chucks are used to create air cushion to assist in aligning the wafers when delivered by the pickup head.
27 Citations
20 Claims
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1. A substrate processing system, comprising:
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a processing chamber defining a processing zone; a first chuck array coupled to a first transport mechanism positioned on a first side, wherein the first chuck array is configured to be linearly movable back and forth on the first transport mechanism; a second chuck array coupled to a second transport mechanism positioned on a second side, opposite the first side, wherein the second chuck array is configured to be linearly movable back and forth on the second transport mechanism; and wherein each of the first and second transport mechanism is configured to be movable in elevation direction to enable one of the first and second chuck arrays to pass below the other one of the first and second chuck arrays. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A wafer processing system, comprising:
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a vacuum enclosure; a processing chamber attached to the vacuum enclosure and defining a processing zone within the vacuum enclosure; a first rail assembly positioned inside the vacuum enclosure on one side of the processing chamber; a first elevation mechanism coupled to the first rail assembly and configured to raise the first rail assembly to elevated position and lower the first elevation assembly to lower position; a second rail assembly positioned inside the vacuum enclosure on oposite side of the first rail assembly; a second elevation mechanism coupled to the second rail assembly and configured to raise the second rail assembly to elevated position and lower the second elevation assembly to lower position; a first chuck assembly positioned and configured to ride on the first rail assembly; and
,a second chuck assembly positioned and configured to ride on the second rail assembly. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18)
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19. In a system having a loading zone, a transport zone, an unloading zone, and a processing zone, a method for processing wafers, comprising:
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loading plurality of wafers onto a chuck array in a loading zone; transporting the chuck array at a first speed towards the processing zone and, once arriving at the processing zone transporting the chuck array at a second speed slower than the first speed; processing the wafers during transport in the processing zone; once processing zone has been traversed, transporting the chuck array at the first speed towards unloading zone and unloading the wafers at the unloading zone; once the wafers have been unloaded, lowering the chuck array and returning the loading zone at the first speed. - View Dependent Claims (20)
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Specification