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METHODS FOR DEPOSITING NICKEL FILMS AND FOR MAKING NICKEL SILICIDE AND NICKEL GERMANIDE

  • US 20130115768A1
  • Filed: 08/22/2012
  • Published: 05/09/2013
  • Est. Priority Date: 12/19/2008
  • Status: Active Grant
First Claim
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1. A method of depositing a nickel thin film on a substrate by multiple cycles of a vapor deposition process, each cycle comprising alternately and sequentially contacting a substrate in a reaction space with a vapor phase nickel precursor and a second precursor, wherein in each cycle a layer of nickel precursor is formed on the substrate surface and the second reactant reacts with the nickel precursor to form a nickel thin film.

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