ACOUSTIC ARRAY SENSOR

• US 20130118253A1
• Filed: 11/14/2012
• Published: 05/16/2013
• Est. Priority Date: 11/14/2011
• Status: Active Grant

• Current Assignee: Texzec, Inc.
• Original Assignee: Street Smart Sensors, LLC
• Inventors: Knowles, Terence J., Bremigan, Charles F. III
• Granted Patent: US 9,880,044 B2
• Time in Patent Office: Days
• US Class Current: 73/290.V
• CPC Class Codes: G01F 23/296 Acoustic waves
• CPC Class Codes: G01F 23/2962 Measuring transit time of reflected waves
• CPC Class Codes: G01F 23/2965 Measuring attenuation of transmitted waves

Abstract

A level sensor includes a substrate having at least one reflective side surface, at least one wave generator on one end of the substrate configured to transmit a wave down the surface of the substrate and a plurality of reflective echelons mounted on the substrate such that each echelon is at an angle relative to reflective side surface. The reflective echelons are configured to convert a wave of a first mode in to a wave of a second mode.

Claims

1. A level sensor including:

a substrate having at least one reflective side surface;

at least one wave generator on one end of the substrate configured to transmit a wave along the surface of the substrate; and

a plurality of reflective echelons positioned on the substrate such that each echelon is at an angle relative to a reflective side surface of the substrate,

wherein the reflective echelons are configured to convert a wave of a first mode to a wave of a second mode and direct the converted wave toward the reflective surface.

2. The level sensor of claim 1, wherein the angle is approximately 39.1 degrees.

3. The level sensor of claim 1 wherein the wave transmitted along the surface of the substrate is a shear wave.

4. The level sensor of claim 1 wherein the wave transmitted along an axis of the substrate is a zeroth order shear wave.

5. The level sensor of claim 4 wherein each echelon is configured to convert the zeroth order shear wave into an anti-symmetric, first order Lamb flexural wave.

6. The level sensor of claim 5 wherein the reflective side surface is configured to reflect the Lamb flexural wave back toward the echelon where it is converted to a zeroth order shear wave and directed back toward the wave generator.

7. The level sensor of claim 1 including a reflective end surface on an end of the substrate opposite the wave generator.

8. The level sensor of claim 1 wherein a portion of the substrate is immersed in an aerated fluid.

9. The level sensor of claim 1 wherein the wave generator is configured to transmit a slow torsional mode wave along the length of the substrate.

10. The level sensor of claim 1 wherein the echelons are formed on the surface of the substrate, and the height of each of the plurality of echelons increases along the length of the substrate in a direction away from the wave generator.

11. The level sensor of claim 1 wherein the echelons are formed by etching the surface of the substrate, and the depth the substrate is etched decreases along the length of the substrate in a direction away from the wave generator.

12. The level sensor of claim 1 wherein the at least one wave generator is a transducer.

13. The level sensor of claim 12 wherein the transducer is configured to transmit a shear wave.

14. The level sensor of claim 1 wherein the angle is a 45 degree angle.

15. A method of determining the level of a fluid, the method containing the steps of:

transmitting a first wave operating in a first mode along a surface of a substrate by at least one wave generator coupled to the substrate;

converting a portion of the wave from a first mode to a second mode when the wave reaches each of a plurality of echelons on the substrate;

directing the converted wave off each of the plurality of echelons toward a portion of a reflective side surface of the substrate;

reflecting the converted wave from the reflective side surface toward each of the plurality of echelons;

converting the wave reflected from the side surface from a second mode back to a first mode; and

directing the converted first mode wave back toward the wave generator.

16. The method of claim 15 wherein the angle is approximately 39.1 degrees.

17. The method of claim 15 wherein the wave transmitted along the surface of the substrate is a shear wave.

18. The method of claim 15 wherein the wave transmitted along the surface of the substrate is a zeroth order shear wave.

19. The method of claim 18 wherein each echelon is configured to convert the zeroth order shear wave into an anti-symmetric, first order Lamb flexural.

20. The method of claim 19 wherein the reflective side surface is configured to reflect the Lamb flexural wave back toward the echelon where it is converted to a zeroth order shear wave by the echelon.

21. The method of claim 15 including the step of reflecting the wave from an end of the substrate opposite the wave generator back toward the wave generator.

22. The method of claim 15 wherein a portion of the substrate is immersed in an aerated fluid.

23. The method of claim 15 including the step of transmitting a slow torsional mode wave along the length of the substrate.

24. The method of claim 15 wherein the echelons are formed on the surface of the substrate, and the height of each of the plurality of echelons increases along the length of the substrate in a direction away from the wave generator.

25. The method of claim 15 wherein the echelons are formed by etching the surface of the substrate, and the depth the substrate is etched decreases along the length of the substrate in a direction away from the wave generator.

26. A level sensor including:

a substrate having at least one reflective side surface;

at least one wave generator on one end of the substrate configured to transmit a wave along the surface of the substrate; and

a plurality of reflective echelons positioned on the substrate such that each echelon is at an angle relative to a reflective side surface of the substrate,

wherein the reflective echelons are configured to direct a wave toward the reflective side surface and to direct a wave reflected from the reflective side surface back to the wave generator.

27. A tank including:

at least one wave generator on top surface of the tank that is configured to transmit a wave along the surface of the substrate; and

a plurality of echelons formed on a first surface of the tank such that each echelon is at an angle relative to a reflective side surface of the tank,

wherein the reflective echelons are configured to direct a wave toward the reflective side surface and to direct a wave reflected from the reflective side surface back to the wave generator.

28. A reflective array including:

a substrate, having at least two reflective side surfaces;

a plurality of echelons each arranged along a centerline of the substrate, with each echelon being tilted in relation to the centerline by an angle;

a transducer positioned on an end of the substrate opposite a reflective side surface, the transducer configured to transmit an acoustic wave of a first mode along the substrate.

29. The reflective array of claim 28, wherein the angle is sufficient to convert a zeroth order shear wave in to an anti-symmetric, first order Lamb mode.