Plasma Processing Assemblies Including Hinge Assemblies

• US 20130126092A1
• Filed: 12/09/2011
• Published: 05/23/2013
• Est. Priority Date: 11/21/2011
• Status: Active Grant

• Current Assignee: Lam Research Corporation
• Original Assignee: Lam Research Corporation
• Inventors: Sexton, Greg
• Granted Patent: US 8,826,857 B2
• Time in Patent Office: Days
• US Class Current: 156/345.1
• CPC Class Codes: H01J 37/32513 Sealing means, e.g. sealing between different parts of the vessel
• CPC Class Codes: H01J 37/32807 Construction (includes replacing parts of the apparatus)
• CPC Class Codes: H01J 37/3288 Maintenance

Abstract

In one embodiment, a plasma processing assembly may include an upper process body coupled to a hinge body and a lower process body coupled to a base hinge member. The hinge body can be pivotally engaged with the base hinge member. A self locking latch can be pivotally engaged with the base hinge member. When the hinge body is rotated around the first axis of rotation, the protruding latch engagement member can contact the self locking latch and can rotate the self locking latch around the second axis of rotation opposite to the bias direction. The self locking latch can rotate around the second axis of rotation in the bias direction and can block the hinge body from rotating around the first axis of rotation.

Claims

1. A plasma processing assembly comprising:

a lower process body comprising a lower vacuum chamber formed therein;

a base hinge member mounted to the lower process body;

a hinge body pivotally engaged with the base hinge member and mounted to an upper process body, wherein the base hinge member and the hinge body rotate with respect to one another around a first axis of rotation such that motion of the upper process body is constrained by the base hinge member and the hinge body, and wherein the hinge body comprises a protruding latch engagement member;

a self locking latch pivotally engaged with the base hinge member, wherein the self locking latch and the base hinge member rotate with respect to one another around a second axis of rotation and the self locking latch is biased in a bias direction, and wherein;

when the hinge body is rotated around the first axis of rotation from a closed position and towards a locked position, the protruding latch engagement member contacts of the self locking latch and rotates the self locking latch around the second axis of rotation opposite to the bias direction; and

when the hinge body is rotated around the first axis of rotation into the locked position, the self locking latch rotates around the second axis of rotation in the bias direction and blocks the hinge body from rotating around the first axis of rotation into the closed position.

2. The plasma processing assembly of claim 1, wherein the base hinge member comprises a mounting platform that is coupled to the lower process body and one or more lobe members that extend away from the mounting platform.

3. The plasma processing assembly of claim 2, further comprising an elongate slot and a hinge pin, wherein the elongate slot is formed in at least one of the lobe members, and the hinge pin is inserted in the elongate slot substantially in alignment with the first axis of rotation.

4. The plasma processing assembly of claim 3, wherein the hinge body surrounds and rotates around the hinge pin.

5. The plasma processing assembly of claim 4, wherein the hinge body is located between two of the lobe members.

6. The plasma processing assembly of claim 3, wherein the hinge pin fastened within the elongate slot and slides vertically within the elongate slot.

7. The plasma processing assembly of claim 3, further comprising a set screw, wherein the set screw is engaged with one of the lobe members and contacts the hinge pin within the elongate slot.

8. The plasma processing assembly of claim 1, wherein the second axis of rotation is substantially orthogonal to the first axis of rotation.

9. The plasma processing assembly of claim 1, wherein the self locking latch comprises a recessed surface and an angled ridge, wherein the recessed surface and the angled ridge demarcate a hinge locking cavity.

10. The plasma processing assembly of claim 9, wherein the protruding latch engagement member comprises a detent and the self locking latch comprises a latch opening groove, such that when the self locking latch is rotated around the second axis of rotation from the closed position and towards a release position, the detent of the protruding latch engagement member engages the latch opening groove of the self locking latch and holds the self locking latch in the release position.

11. The plasma processing assembly of claim 10, wherein when the hinge body is rotated around the first axis of rotation away from the release position and towards the closed position, the detent of the protruding latch engagement member disengages the latch opening groove of the self locking latch and the self locking latch rotates around the second axis of rotation in the bias direction.

12. The plasma processing assembly of claim 1, wherein the upper process body is balanced such that when the upper process body is rotated around the first axis of rotation to an angle less than a balance angle, measured with respect to the lower process body, the upper process body automatically rotates to the closed position.

13. The plasma processing assembly of claim 1, wherein the upper process body is balanced such that when the upper process body is rotated around the first axis of rotation to an angle greater than a balance angle, measured with respect to the lower process body, the upper process body automatically rotates to the locked position.

14. The plasma processing assembly of claim 13, wherein the balance angle is less than about 60°

(about 1.05 radians).

15. The plasma processing assembly of claim 1, further comprising an O-ring seated in the upper process body or the lower process body, wherein when in the closed position, the upper process body interlocks with the lower process body and the O-ring to seal the lower vacuum chamber.

16. The plasma processing assembly of claim 1, wherein the upper process body comprises an alignment pin and the lower process body comprises a pin accepting orifice, and when in the closed position, the alignment pin and the pin accepting orifice interlock to align the upper process body with respect to the lower process body.