EXPOSURE APPARATUS USING MICROLENS ARRAY AND OPTICAL MEMBER

• US 20130128253A1
• Filed: 07/26/2011
• Published: 05/23/2013
• Est. Priority Date: 08/30/2010
• Status: Active Grant

• Current Assignee: V Technology Co., Ltd.
• Original Assignee: V Technology Co., Ltd.
• Inventors: Mizumura, Michinobu, Arai, Toshinari
• Granted Patent: US 9,304,391 B2
• Time in Patent Office: Days
• US Class Current: 355/67
• CPC Class Codes: G02B 3/0056 arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses G02B3/0043 takes precedence; miniaturised objectives for electronic devices employing wafer level optics G02B13/0085
• CPC Class Codes: G02B 3/0068 arranged in a single integral body or plate, e.g. laminates or hybrid structures with other optical elements G02B5/1885, G02B17/002, G02B30/27 take precedence
• CPC Class Codes: G03F 1/38 Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
• CPC Class Codes: G03F 1/42 Alignment or registration features, e.g. alignment marks on the mask substrates
• CPC Class Codes: G03F 9/7038 Alignment for proximity or contact printer proximity or contact printers per se G03F7/7035
• CPC Class Codes: G03F 9/7096 Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus

Abstract

An exposure apparatus and an optical member wherein impurities can be prevented from infiltrating between microlens arrays and a substrate, and microlenses can be prevented from being scratched by the impurities and by getting abnormally close to the substrate. Microlens arrays in which pluralities of microlenses are formed are arranged above a transparent substrate, and the microlens arrays are bonded and the end surfaces to a mask. Alignment mark supports are bonded to the mask at both sides of the microlens arrays, and alignment marks are formed in the surfaces of the alignment mark supports that face the substrate. The spaces between the alignment mark supports and the substrate are smaller than the spaces between the microlens arrays and the substrate.

Claims

1. An exposure apparatus using a microlens array, comprising:

a substrate stage for supporting a transparent substrate to be subjected to exposure;

a microlens array arranged above the substrate stage and having a plurality of microlenses formed therein;

a light-blocking mask arranged above the microlens array and fixed to said microlens array;

an exposure light source;

an optical device for guiding outgoing exposure light from the exposure light source to said light-blocking mask and using said microlens array to image exposure light transmitted through said light-blocking mask onto a substrate on said substrate stage;

an alignment mark support arranged in the surface of said mask that faces said substrate;

an alignment mark formed in the surface of the alignment mark support that faces said substrate; and

mark detection means for radiating light transmitted through said transparent substrate onto said alignment mark and detecting a substrate mark provided to said transparent substrate and said alignment mark within the same field of vision, the mark detection means being arranged below said transparent substrate;

wherein the space between said alignment mark support and said substrate is smaller than the space between said microlenses and said substrate.

2. The exposure apparatus using a microlens array according to claim 1, wherein a concave part or a step is formed in the surface of said alignment mark support that faces said substrate, and said alignment mark is formed in a low position in said concave part or step.

3. The exposure apparatus using a microlens array according to claim 1, wherein said microlens array and said transparent substrate are capable of moving relative to each other, and a pair of said alignment marks are formed at both ends of said mask in a direction orthogonal to said movement direction.

6. The exposure apparatus using a microlens array according to claim 2, wherein said microlens array and said transparent substrate are capable of moving relative to each other, and a pair of said alignment marks are formed at both ends of said mask in a direction orthogonal to said movement direction.

4. An optical member, comprising:

a microlens array for imaging exposure light on a substrate to be subjected to exposure and exposing the substrate;

a light-blocking mask fixed to the microlens array so as to be parallel to said microlens array;

an alignment mark support arranged farther outside than said microlens array in the surface of the mask on the side where said microlens array is arranged; and

an alignment mark formed in the distal end surface of the alignment mark support;

wherein the distance between the distal end surface of said alignment mark support and said mask is greater than the distance between the distal end surface of said microlens array and said mask.

5. The optical member using a microlens array according to claim 4, wherein a concave part or a step is formed in the distal end surface of said alignment mark support, and said alignment mark is formed in a low position in said concave part or step.