Method and System for Realizing a Vacuum in a Vacuum Chamber

• US 20130133752A1
• Filed: 01/02/2013
• Published: 05/30/2013
• Est. Priority Date: 02/22/2009
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: Mapper Lithography IP B.V (ASML Holding NV)
• Inventors: BALTUSSEN, Sander
• Granted Patent: US 8,857,465 B2
• Time in Patent Office: Days
• US Class Current: 137/14
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: F17D 1/00 Pipe-line systems conveying articles or materials through a pipe- line by means of a fluid carrier B65G51/00, B65G53/00; liquids B67D; special devices for transferring liquids from bulk storage containers into vehicles or boats or vice versa, e.g. loading or unloading vehicles or portable containers B67D7/00; conveying material which has been excavated by a dredger or soil shifter through a pipe-line E02F7/10; sewer pipe-line systems E03F3/00; thermal insulation of pipe-lines F16L59/00; central heating systems F24D
• CPC Class Codes: H01J 2237/1825 Evacuating means
• CPC Class Codes: H01J 37/18 Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
• CPC Class Codes: H01J 37/3174 Particle-beam lithography, e.g. electron beam lithography
• CPC Class Codes: Y10S 417/901 Cryogenic pumps
• CPC Class Codes: Y10T 137/0396 Involving pressure control
• CPC Class Codes: Y10T 137/86083 Vacuum pump
• CPC Class Codes: Y10T 137/86131 Plural

Abstract

The invention relates to a method for realizing a vacuum in at least one vacuum chamber. The method comprises providing an arrangement comprising a plurality of vacuum chambers, wherein each vacuum chamber is connected to a shared vacuum system. The shared vacuum system comprises a plurality of turbo molecular pumps, at least one common fore pump, and a piping system comprising one or more pipes for connecting the at least one common fore pump to each of the plurality of turbo molecular pumps. Each turbo molecular pump is separately connected to a corresponding vacuum chamber. The piping system further comprises flow regulators for controlling a flow within the piping system. The method further comprises selecting at least one vacuum chamber for pump-down, and separately pumping down the at least one selected vacuum chamber by means of the shared vacuum system.

Claims

1. A method for realizing a vacuum in at least one vacuum chamber, wherein the method comprises:

providing an arrangement comprising a plurality of vacuum chambers, wherein each vacuum chamber is connected to a shared vacuum system comprising;

a plurality of turbo molecular pumps, each turbo molecular pump being separately connected to a corresponding vacuum chamber;

at least one common fore pump, and

a piping system comprising one or more pipes for connecting the at least one common fore pump to each of the plurality of turbo molecular pumps, the piping system further comprising flow regulators for controlling a flow within the piping system;

selecting at least one vacuum chamber for pump-down; and

separately pumping down the at least one selected vacuum chamber by means of the shared vacuum system.

2. The method of claim 1, wherein separately pumping down the at least one selected vacuum chamber comprises:

activating, in a first pumping stage, the at least one common fore pump for jointly pumping down selected vacuum chambers to a pressure with a first pressure value, and

activating, in a second pumping stage, the turbo molecular pump of the at least one selected vacuum chamber for separately pumping down the selected vacuum chambers to a pressure with a second pressure value, the second pressure value being lower than the first pressure value.

3. The method of claim 2, wherein the first pumping stage comprises removing gas and vapor directly from the selected vacuum chambers by means of the at least one common fore pump.

4. The method of claim 3, wherein the second pumping stage comprises maintaining an outlet pressure of the turbo molecular pumps of the selected vacuum chambers below a predetermined pressure value by means of the at least one common fore pump.

5. The method of claim 2, further comprising de-activating the at least one fore pump at a predetermined time after activating the at least one turbo molecular pump.

6. The method of claim 1, wherein requirements of a component for servicing more than one vacuum chamber correspond to requirements for such components if only a single vacuum chamber was to be serviced.

7. The method according to claim 1, wherein the vacuum system further comprises a shared cryogenic pump system for cooling cryogenic cooling surfaces included in or against each chamber.

8. The method according to claim 7, wherein the method further comprises activating the cryogenic pump system in a third stage of operation towards vacuum when the pressure in a chamber in evacuation has reached a pressure value below a predetermined threshold value.

9. The method of claim 1, further comprising closing a flow regulator for isolating the turbo molecular pump from a selected vacuum chamber, and deactivating the turbo molecular pump.

21. Computer readable medium for performing, when executed by a processor, the method as defined by claim 1.

10. A lithography system comprising:

a plurality of vacuum chambers;

a shared vacuum system connected to each vacuum chamber, and arranged for evacuating the vacuum chambers, wherein the vacuum system comprises;

a plurality of turbo molecular pumps, each turbo molecular pump being separately connected to a corresponding vacuum chamber;

at least one common fore pump;

a piping system comprising one or more pipes for connecting the at least one common fore pump to each of the plurality of turbo molecular pumps, the piping system further comprising flow regulators for controlling a flow within the piping system, and

a control system in signal communication with the flow regulators, the fore pump, and the plurality of turbo molecular pumps, wherein the control system is configured for controlling a selection of at least one vacuum chamber for pump-down and a separate pumping down of the at least one selected vacuum chamber.

11. The system according to claim 10, wherein the control system is configured for:

activating, in a first pumping stage, the common fore pump for jointly pumping down selected vacuum chambers to a pressure with a first pressure value, and

activating, in a second pumping stage, the turbo molecular pumps of the selected vacuum chambers for separately pumping down the selected vacuum chambers to a pressure with a second pressure value, the second pressure value being lower than the first pressure value.

12. The system of claim 10, wherein the shared vacuum system further comprises a cryopump system, the cryopump system comprising one or more cooling fluid reservoirs or cooling units, a plurality of cryogenic surface structures and cooling lines connecting the cooling fluid reservoirs or cooling units with the cryogenic surface structures, and wherein the cryogenic surface structures are distributed among the plurality of vacuum chambers of the lithography system.

13. The system of claim 12, wherein the cryopump system further comprises one or more flow regulation devices for controlling transfer of cooling fluid through the cooling lines to or away from one or more cryogenic surface structures.

14. The system of claim 12, wherein each vacuum chamber comprises a cryogenic surface structure of the cryopump system.

15. The system of claim 10, wherein at least one vacuum chamber comprises a further flow regulation device for isolating the vacuum pump system from the vacuum chamber.

16. The system of claim 10, wherein at least one vacuum chamber comprises one or more light emitting diodes for emitting radiation in the ultraviolet spectrum.

17. The system of claim 10, wherein at least one vacuum chamber is arranged with dedicated wall portions for allowing a coupling of ultraviolet radiation into the chamber.

18. The system of claim 10, wherein at least one vacuum chamber is arranged for accommodating a lithography apparatus comprising:

an illumination source for creating one or more illumination beams;

a projection system for projecting the beams onto a substrate; and

a moveable substrate support structure for carrying the substrate;

wherein the vacuum chamber comprises at least one opening for transferring the moveable substrate support structure carrying a substrate into and/or out of the chamber.

19. The system of claim 18, wherein the illumination source is a charged particle source, and the one or more illumination beams are charged particle beams.

20. The system of claim 19, wherein the lithography apparatus comprises one or more self-contained and removable modules, the one or more removable modules comprising one or more of:

an illumination optics module including an illumination source and beam collimating system;

an aperture array and condenser lens module including an aperture array and condenser lens array;

a beam switching module including a beamlet blanker array; and

a projection optics module including a beam stop array, beam deflector array, and one or more projection lens arrays.