FILM FORMATION APPARATUS, FILM FORMATION METHOD, AND MASK UNIT TO BE USED FOR THEM

• US 20130137334A1
• Filed: 11/13/2012
• Published: 05/30/2013
• Est. Priority Date: 11/29/2011
• Status: Abandoned Application

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Ishikawa, Nobuyuki
• Application Number:
  US13/675,238
• Publication Number:
  US 20130137334A1
• Time in Patent Office: Days
• US Class Current: 445/58
• CPC Class Codes: C23C 14/042 using masks
• CPC Class Codes: C23C 14/12 Organic material
• CPC Class Codes: C23C 14/584 Non-reactive treatment
• CPC Class Codes: C23C 14/5886 Mechanical treatment involving removal of material C23C14/588
• CPC Class Codes: C23C 16/042 using masks
• CPC Class Codes: H10K 71/191 characterised by provisions for the orientation or alignment of the layer to be deposited

Abstract

Provided is a film formation apparatus for manufacturing an apparatus such as an organic electroluminescence light emitting apparatus, which has high resolution and high productivity. The film formation apparatus includes: multiple mask unit holding portions for supporting mask units, respectively; multiple alignment mechanisms provided in accordance with the multiple mask unit holding portions; and a vapor deposition source in which the multiple mask units are aligned and arranged by the multiple alignment mechanisms one by one with respect to one substrate, and then film formation is performed.

Claims

1. A film formation apparatus, comprising:

multiple mask unit holding portions for supporting multiple mask units, respectively;

multiple alignment mechanisms provided in accordance with the multiple mask unit holding portions; and

a vapor deposition source,

wherein the multiple mask units are aligned and arranged by the multiple alignment mechanisms one by one with respect to one substrate.

2. The film formation apparatus according to claim 1, further comprising a film formation chamber and an alignment chamber,

wherein the vapor deposition source is provided in the film formation chamber, and

wherein the multiple alignment mechanisms are provided in the alignment chamber.

3. A mask unit to be used in the film formation apparatus according to claim 1, the mask unit comprising:

a mask member comprising an opening portion in which multiple opening pattern units are arranged in parallel to each other; and

a frame for fixing the mask member,

wherein the frame comprises;

two mask member fixing portions each including a surface for fixing the mask member; and

a support portion fixed to a surface of each of the two mask member fixing portions on a side opposite to a side on which the mask member is fixed, the support portion supporting the two mask member fixing portions.

4. The mask unit according to claim 3, wherein the mask member comprises the multiple opening pattern units provided in a row.

5. The mask unit according to claim 3, wherein the mask member has a long-side length which corresponds to a short-side length of a substrate to be subjected to film formation with use of the mask unit.

6. The mask unit according to claim 3, wherein the mask member comprises alignment marks at one of both end portions in a long-side direction of the mask member or a position at a certain distance from both the end portions.

8. The film formation method according to claim 7, wherein the film formation method uses the film formation apparatus according to claim 1 and the mask unit according to claim 3.

9. The film formation method according to claim 8, wherein the aligning comprises arranging the substrate between the mask member and the support portion.

11. The method of manufacturing an organic electroluminescence display apparatus according to claim 10, wherein the forming an emission layer is carried out with use of the film formation apparatus according to claim 1.

7. A film formation method of forming a patterned film on a substrate, the film formation method comprising:

preparing multiple mask units each including opening pattern units;

aligning the multiple mask units one by one with respect to the substrate; and

collectively forming films on the substrate via the opening pattern units of the multiple mask units.

10. A method of manufacturing an organic electroluminescence display apparatus, the method comprising:

preparing a substrate including a circuit; and

forming an emission layer on the substrate,

wherein the forming an emission layer is carried out by the film formation method according to claim 7.

12. The method of manufacturing an organic electroluminescence display apparatus according to claim 10, wherein the forming an emission layer is carried out with use of the mask unit according to claim 3.