PLASMA DIAGNOSTIC APPARATUS AND METHOD
First Claim
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1. A plasma diagnostic apparatus comprising:
- a vacuum chamber unit having at least one electrode and configured to generate plasma;
a bias power unit disposed inside the vacuum chamber unit and configured to apply a radio frequency voltage to an electrode that supports a wafer;
a spectrum unit configured to decompose light emitted from inside the plasma according to wavelengths;
a light detection unit configured to detect the light decomposed according to wavelengths; and
a control unit configured to control a turn-on and turn-off process of the light detection unit according to a waveform of the radio frequency voltage.
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Abstract
A plasma diagnostic apparatus includes a vacuum chamber unit having at least one electrode and having plasma generated inside. A bias power unit is disposed inside the vacuum chamber unit to apply a radio frequency voltage to an electrode that supports a wafer. A spectrum unit decomposes light emitted from inside the plasma according to wavelengths. A light detection unit detects the light decomposed according to wavelengths. A control unit controls a turn-on and turn-off process of the light detection unit according to a waveform of the radio frequency voltage.
14 Citations
15 Claims
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1. A plasma diagnostic apparatus comprising:
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a vacuum chamber unit having at least one electrode and configured to generate plasma; a bias power unit disposed inside the vacuum chamber unit and configured to apply a radio frequency voltage to an electrode that supports a wafer; a spectrum unit configured to decompose light emitted from inside the plasma according to wavelengths; a light detection unit configured to detect the light decomposed according to wavelengths; and a control unit configured to control a turn-on and turn-off process of the light detection unit according to a waveform of the radio frequency voltage. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A plasma diagnostic method comprising:
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generating plasma inside a vacuum chamber unit having at least one electrode while applying a radio frequency voltage to an electrode, the electrode disposed inside the vacuum chamber unit to support a wafer; decomposing light emitted from inside the plasma through a spectrum unit according to wavelengths; and detecting the light decomposed according to wavelengths through a light detection unit while controlling a turn-on and turn-off process of the light detection unit according to a waveform of the radio-frequency voltage. - View Dependent Claims (9, 13, 14, 15)
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- 10. The plasma diagnostic method of 9, wherein the detecting the light decomposed according to wavelengths includes detecting an optical flux and controlling a time delay of the gate signal according to a phase difference between the radio frequency voltage and the optical flux.
Specification