COMPOSITIONS AND METHODS TO FABRICATE A PHOTOACTIVE SUBSTRATE SUITABLE FOR SHAPED GLASS STRUCTURES
First Claim
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1. A shaped glass structure with a high anisotropic-etch ratio comprising:
- a photosensitive glass substrate with a glass transformation temperature, wherein the photosensitive glass substrate comprises;
a glass composition comprising60-76 weight % silica,6 weight %-16 weight % of a combination of K2O and Na2O withat least 3 weight % K2O,0.001-1 weight % Ag2O,0.75 weight %-7 weight % B2O3, and5-8 weight % Al2O3, with the combination of B2O3, and Al2O3 not exceeding 13 weight %,8-15 weight % Li2O, and0.04-0.1 weight % CeO2, andone or more patterned structure.
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Abstract
A shaped photosensitive glass composition comprising silica, K2O, Na2O, Ag2O, B2O3, Al2O3, Li2O, and CeO2 with a high anisotropic-etch ratio formed by a novel construction method. Furthermore, such shaped glass structures can be used to form a negative mold for casting the shape in other materials. Structures of the photosensitive glass composition may include micro-channels, micro-optics, microposts, or arrays of hollow micro-needles.
23 Citations
14 Claims
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1. A shaped glass structure with a high anisotropic-etch ratio comprising:
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a photosensitive glass substrate with a glass transformation temperature, wherein the photosensitive glass substrate comprises; a glass composition comprising 60-76 weight % silica, 6 weight %-16 weight % of a combination of K2O and Na2O with at least 3 weight % K2O, 0.001-1 weight % Ag2O, 0.75 weight %-7 weight % B2O3, and 5-8 weight % Al2O3, with the combination of B2O3, and Al2O3 not exceeding 13 weight %, 8-15 weight % Li2O, and 0.04-0.1 weight % CeO2, and one or more patterned structure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 13, 14)
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12. The shaped glass structure of claim 22, wherein the anisotropic-etch ratio of exposed portion to said unexposed portion is at least one of 10-20:
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21-29;
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30-45;
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20-40;
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41-45;
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30-50;
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Specification