×

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, MAKING METHOD, PATTERN FORMING PROCESS, AND ELECTRIC/ELECTRONIC PART PROTECTING FILM

  • US 20130149645A1
  • Filed: 12/05/2012
  • Published: 06/13/2013
  • Est. Priority Date: 12/09/2011
  • Status: Active Grant
First Claim
Patent Images

1. A chemically amplified negative resist composition comprising(A) a resin having a crosslinking group or a reaction site susceptible to crosslinking reaction within the molecule,(B) a crosslinker,(C) a photoacid generator which is decomposed to generate an acid upon exposure to light of wavelength 190 to 500 nm,(D) a solvent, and(E) an isocyanuric acid of the structure having the general formula (1):

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×