Source Mask Optimization to Reduce Stochastic Effects
First Claim
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1. A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising:
- defining a multi-variable cost function, the multi-variable cost function being a function of a stochastic effect of the lithographic process, the stochastic effect being a function of a plurality of design variables that are characteristics of the lithographic process; and
reconfiguring one or more of the characteristics of the lithographic process by adjusting one or more of the design variables until a certain termination condition is satisfied.
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Abstract
Disclosed herein is a computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising defining a multi-variable cost function, the multi-variable cost function being a function of a stochastic effect of the lithographic process.
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Citations
20 Claims
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1. A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising:
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defining a multi-variable cost function, the multi-variable cost function being a function of a stochastic effect of the lithographic process, the stochastic effect being a function of a plurality of design variables that are characteristics of the lithographic process; and reconfiguring one or more of the characteristics of the lithographic process by adjusting one or more of the design variables until a certain termination condition is satisfied. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 20)
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18. A computer-implemented method for increasing a throughput of a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising:
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defining a multi-variable cost function, the multi-variable cost function being a function of a stochastic effect of the lithographic process, and being a function of an exposure time of the substrate in the lithographic projection apparatus, the stochastic effect being a function of a plurality of design variables that are characteristics of the lithographic process; and reconfiguring one or more of the characteristics of the lithographic process by adjusting one or more of the design variables until a certain termination condition is satisfied. - View Dependent Claims (19)
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Specification