Multi-Chamber Substrate Processing System
First Claim
1. A substrate processing platform for processing a plurality of substrates, the substrate processing platform comprising:
- one or more gas distribution assemblies;
a rotary track mechanism, positioned at a first distance below the one or more gas distribution assemblies to receive the plurality of substrates supported by a plurality of substrate support carriers disposed thereon; and
a dual-blade transfer robot capable of carrying two substrates and concurrently transferring the two substrates onto and out of two substrate carriers disposed on the rotary track mechanism,wherein the rotary track mechanism is capable of concurrently receiving at least two substrates and to rotate at a first rotating speed such that the plurality of substrates disposed on the plurality of substrate carriers are rotated under and passed through the one or more gas distribution assemblies.
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Accused Products
Abstract
A substrate processing system for processing multiple substrates is provided and generally includes at least one substrate processing platform and at least one substrate staging platform. The substrate processing platform includes a rotary track system capable of supporting multiple substrate support assemblies and continuously rotating the substrate support assemblies, each carrying a substrate thereon. Each substrate is positioned on a substrates support assembly disposed on the rotary track system and being processed through at least one shower head station and at least one buffer station, which are positioned atop the rotary track system of the substrate processing platform. Multiple substrates disposed on the substrate support assemblies are processed in and out the substrate processing platform. The substrate staging platform includes at least one dual-substrate processing station, each dual-substrate processing station includes two substrate support assemblies for supporting two substrates thereon.
40 Citations
20 Claims
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1. A substrate processing platform for processing a plurality of substrates, the substrate processing platform comprising:
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one or more gas distribution assemblies; a rotary track mechanism, positioned at a first distance below the one or more gas distribution assemblies to receive the plurality of substrates supported by a plurality of substrate support carriers disposed thereon; and a dual-blade transfer robot capable of carrying two substrates and concurrently transferring the two substrates onto and out of two substrate carriers disposed on the rotary track mechanism, wherein the rotary track mechanism is capable of concurrently receiving at least two substrates and to rotate at a first rotating speed such that the plurality of substrates disposed on the plurality of substrate carriers are rotated under and passed through the one or more gas distribution assemblies. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A method of processing a plurality of substrates, the method comprising:
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loading a plurality of substrates onto a rotary track mechanism in a processing chamber comprising a plurality of gas distribution assemblies so that the substrates are rotationally disposed about the interior of the processing chamber adjacent a rotary track mechanism and positioned in substantially equivalent starting positions; rotating the rotary track mechanism so that each substrate moves from a first side of a gas distribution assembly to a second side of the gas distribution assembly so that layer is deposited on a surface of the substrate by a plurality of gas streams provided by the gas distribution assembly; continuing to rotate the rotary track mechanism so that each substrate moves from the first side of a gas distribution assembly to the second side of the gas distribution assembly until a film of desired thickness is formed; and unloading the plurality of substrates from the processing chamber so that each substrate has experienced substantially the same processing environment. - View Dependent Claims (17)
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18. A method for batch processing a plurality of substrates, the method comprising:
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loading two of the plurality of substrates onto a rotary track mechanism of a batch processing platform; continuously rotating the rotary track mechanism such that the plurality of the substrates are moved under and passed through one or more gas distribution assemblies positioned at a first distance above the rotary track mechanism; and unloading the two substrates from the rotary track mechanism of the batch processing platform. - View Dependent Claims (19, 20)
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Specification