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MULTIPLE VAPOR SOURCES FOR VAPOR DEPOSITION

  • US 20130203267A1
  • Filed: 02/06/2012
  • Published: 08/08/2013
  • Est. Priority Date: 02/06/2012
  • Status: Active Grant
First Claim
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1. An apparatus for vapor deposition, comprising:

  • a reaction space configured to receive a substrate;

    a first plurality of vessels in fluid communication with the reaction space, wherein each vessel of the first plurality of vessels contains a first source chemical; and

    a controller programmed to cause delivery of pulses of gas containing the first source chemical from at least two of the first plurality of vessels to the reaction space during a deposition.

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