ADHESIVE SHEET AND ELECTRONIC DEVICE
First Claim
1. An adhesive sheet, comprising:
- a base material comprising a gas barrier layer and an adhesive layer,wherein the gas barrier layer comprises a material comprising an oxygen atom and a silicon atom;
a surface layer of the gas barrier layer comprises the oxygen atom in an amount of from 60 to 75%, a nitrogen atom in an amount of from 0 to 10%, and the silicon atom in an amount of from 25 to 35% relative to a total amount of the oxygen atom, the nitrogen atom, and the silicon atom; and
a film density in the surface layer is from 2.4 to 4.0 g/cm3.
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Accused Products
Abstract
The invention pertains to an adhesive sheet including a base material having thereon at least a gas barrier layer and an adhesive layer, wherein the gas barrier layer is constituted of a material containing at least an oxygen atom and a silicon atom; in a surface layer part of the gas barrier layer, an existing proportion of an oxygen atom is from 60 to 75%, an existing proportion of a nitrogen atom is from 0 to 10%, and an existing proportion of a silicon atom is from 25 to 35% relative to a total existing amount of the oxygen atom, the nitrogen atom, and the silicon atom; and a film density in the surface layer part of the gas barrier layer is from 2.4 to 4.0 g/cm3, and also to an electronic device provided with the subject adhesive sheet as an electronic device member. The invention is able to provide an adhesive sheet with excellent gas barrier properties, resistance to folding and transparency and also an electronic device provided with the subject adhesive sheet as an electronic device member.
10 Citations
14 Claims
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1. An adhesive sheet, comprising:
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a base material comprising a gas barrier layer and an adhesive layer, wherein the gas barrier layer comprises a material comprising an oxygen atom and a silicon atom;
a surface layer of the gas barrier layer comprises the oxygen atom in an amount of from 60 to 75%, a nitrogen atom in an amount of from 0 to 10%, and the silicon atom in an amount of from 25 to 35% relative to a total amount of the oxygen atom, the nitrogen atom, and the silicon atom; and
a film density in the surface layer is from 2.4 to 4.0 g/cm3. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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Specification