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POLISHING PAD AND METHOD OF MANUFACTURING THE SAME

  • US 20130212951A1
  • Filed: 02/07/2013
  • Published: 08/22/2013
  • Est. Priority Date: 02/20/2012
  • Status: Abandoned Application
First Claim
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1. A method of manufacturing a polishing pad, the method comprising:

  • (a) mixing materials for forming a polishing layer;

    (b) mixing at least two from among inert gas, a capsule type foaming agent, a chemical foaming agent, and liquid microelements that are capable of controlling sizes of pores, with the mixture in (a) so as to form two or more types of pores;

    (c) performing gelling and hardening of the mixture generated in (b) so as to form a polishing layer comprising the two or more types of pores; and

    (d) processing the polishing layer so as to distribute micropores defined by opening the two or more types of pores on a surface of the polishing layer.

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