POLISHING PAD AND METHOD OF MANUFACTURING THE SAME
First Claim
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1. A method of manufacturing a polishing pad, the method comprising:
- (a) mixing materials for forming a polishing layer;
(b) mixing at least two from among inert gas, a capsule type foaming agent, a chemical foaming agent, and liquid microelements that are capable of controlling sizes of pores, with the mixture in (a) so as to form two or more types of pores;
(c) performing gelling and hardening of the mixture generated in (b) so as to form a polishing layer comprising the two or more types of pores; and
(d) processing the polishing layer so as to distribute micropores defined by opening the two or more types of pores on a surface of the polishing layer.
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Abstract
Polishing pad and method of manufacturing the same, the method including: (a) mixing materials for forming a polishing layer; (b) mixing at least two from among inert gas, a capsule type foaming agent, a chemical foaming agent, and liquid microelements that are capable of controlling sizes of pores, with the mixture in (a) so as to form two or more types of pores; (c) performing gelling and hardening of the mixture generated in (b) so as to form a polishing layer including the two or more types of pores; and (d) processing the polishing layer so as to distribute micropores defined by opening the two or more types of pores on a surface of the polishing layer.
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7 Claims
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1. A method of manufacturing a polishing pad, the method comprising:
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(a) mixing materials for forming a polishing layer; (b) mixing at least two from among inert gas, a capsule type foaming agent, a chemical foaming agent, and liquid microelements that are capable of controlling sizes of pores, with the mixture in (a) so as to form two or more types of pores; (c) performing gelling and hardening of the mixture generated in (b) so as to form a polishing layer comprising the two or more types of pores; and (d) processing the polishing layer so as to distribute micropores defined by opening the two or more types of pores on a surface of the polishing layer. - View Dependent Claims (2, 3)
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4. A polishing pad that performs a polishing process by moving in contact with a surface of an object to be polished, the polishing pad comprising a polishing layer,
wherein the polishing layer comprises two or more types of pores, of which sizes are controlled by using at least two from among inert gas, a capsule type foaming agent, a chemical agent, and liquid microelements, and micropores that are defined by opening the two or more types of pores are distributed on a surface of the polishing layer.
Specification