Use of Capacitance And Eddy Currents to Analyze Polycrystalline Diamond

• US 20130214769A1
• Filed: 02/21/2012
• Published: 08/22/2013
• Est. Priority Date: 02/21/2012
• Status: Abandoned Application

• Current Assignee: Varel International Ind LP (Varel International Ind)
• Original Assignee: Varel International Ind LP (Varel International Ind)
• Inventors: King, William W., Bellin, Federico, Chintamaneni, Vamsee
• Application Number:
  US13/401,335
• Publication Number:
  US 20130214769A1
• Time in Patent Office: Days
• US Class Current: 324/222
• CPC Class Codes: G01N 27/22 by investigating capacitance
• CPC Class Codes: G01N 33/40 Grinding-materials

Abstract

A method for non-destructively characterizing one or more regions within a polycrystalline structure using capacitance and eddy current measurements. The eddy current measurements include at least one of an impedance amplitude and a phase shift angle. The capacitance is measured one or more times and compared to a first calibration curve to determine an estimated leaching depth within the polycrystalline structure. A first data scattering range is ascertained from the capacitance measurements to determine a relative porosity or the leaching quality within the polycrystalline structure. The eddy current is measured one or more times and compared to a second calibration curve to determine an estimated leaching depth within the polycrystalline structure. A second data scattering range is ascertained from the eddy current measurements to determine a relative porosity or the leaching quality within the polycrystalline structure. Results from both measurements are used to ascertain a quality of the polycrystalline structure.

Claims

1. A method of characterizing a quality of a polycrystalline structure, comprising:

obtaining a leached component comprising a polycrystalline structure, the polycrystalline structure comprising a leached layer and an unleached layer positioned adjacent to the leached layer, the leached layer having at least a portion of a catalyst material removed from therein;

measuring at least one measured capacitance value of the leached component;

measuring at least one measured eddy current value of the leached component;

characterizing a first quality of the polycrystalline structure, the first quality being based upon the at least one measured capacitance value;

characterizing a second quality of the polycrystalline structure, the second quality being based upon the at least one measured eddy current value; and

determining an overall quality of the polycrystalline structure, the overall quality being based upon the first quality and the second quality.

2. The method of claim 1, further comprising:

obtaining a first calibration curve showing a relationship between a plurality of capacitance values and a plurality of actual leaching depth within the polycrystalline structure; and

obtaining a second calibration curve showing a relationship between a plurality of eddy current values and the plurality of actual leaching depth within the polycrystalline structure;

wherein characterizing the first quality of the polycrystalline structure comprises using the one or more measured capacitance values of the leached component and the first calibration curve to estimate a first actual leaching depth within the leached component, and

wherein characterizing the second quality of the polycrystalline structure comprises using the one or more measured eddy current values of the leached component and the second calibration curve to estimate a second actual leaching depth within the leached component.

3. The method of claim 2, wherein the overall quality comprises averaging the first actual leaching depth and the second actual leaching depth.

4. The method of claim 2, wherein the one or more measured eddy current value comprises at least one of an impedance amplitude and a phase angle shift.

5. The method of claim 1, further comprising:

obtaining a first calibration curve showing a relationship between a plurality of capacitance values and a plurality of actual leaching depth within the polycrystalline structure; and

obtaining a second calibration curve showing a relationship between a plurality of eddy current values and the plurality of actual leaching depth within the polycrystalline structure,

wherein characterizing the first quality of the polycrystalline structure comprises;

determining a first average of the at least one measured capacitance value of the leached component; and

using the first average and the first calibration curve to estimate a first actual leaching depth within the leached component, and

wherein characterizing the second quality of the polycrystalline structure comprises;

determining a second average of the at least one measured eddy current value of the leached component; and

using the second average and the second calibration curve to estimate a second actual leaching depth within the leached component.

6. The method of claim 5, wherein the overall quality comprises averaging the first actual leaching depth and the second actual leaching depth.

7. The method of claim 5, wherein the one or more measured eddy current value comprises at least one of an impedance amplitude and a phase angle shift.

8. The method of claim 1, wherein the one or more measured eddy current value comprises at least one of an impedance amplitude and a phase angle shift.

9. The method of claim 1, further comprising depolarizing the leached component.

10. The method of claim 9, wherein depolarizing the leached component is performed in at least one of before measuring each measured capacitance value and after measuring each measured capacitance value and in at least one of before measuring each measured eddy current value and after measuring each measured eddy current value.

11. The method of claim 9, wherein depolarizing the leached component comprises at least one of grounding the leached component, wrapping the leached component in a depolarizing material, heat treating the leached component, placing the leached component in a salt solution, and waiting a period of time.

12. The method of claim 1, further comprising cleaning the polycrystalline structure from one or more by-product materials, wherein the by-product materials were deposited within the polycrystalline structure during a leaching process that removes at least a portion of the catalyst material from therein and forms the leached component.

13. The method of claim 1, further comprising:

measuring a plurality of measured capacitance values for each of a plurality of the leached components, each leached component being formed during a same leaching process; and

measuring a plurality of measured eddy current values for each of the plurality of the leached components;

wherein characterizing the first quality of the polycrystalline structure comprises using the plurality of measured capacitance values for each leached component to determine a first microstructure quality of the polycrystalline structure for each leached component, and

wherein characterizing the second quality of the polycrystalline structure comprises using the plurality of measured eddy current values for each leached component to determine a second microstructure quality of the polycrystalline structure for each leached component.

14. The method of claim 13, further comprising:

determining a first data scattering range for each of the plurality of the leached components from the plurality of measured capacitance values; and

determining a second data scattering range for each of the plurality of the leached components from the plurality of measured eddy current values,

wherein characterizing the first quality of the polycrystalline structure comprises using the first data scattering range to determine the first microstructure quality of the polycrystalline structure for each leached component, the first microstructure quality of the polycrystalline structure being less porous when the first data scattering range is less in comparison to the first data scattering ranges of other leached components, and

wherein characterizing the second quality of the polycrystalline structure comprises using the second data scattering range to determine the second microstructure quality of the polycrystalline structure for each leached component, the second microstructure quality of the polycrystalline structure being less porous when the second data scattering range is less in comparison to the second data scattering ranges of other leached components.

15. The method of claim 1, wherein the leached layer has at least a portion of a by-product material removed from therein.

16. The method of claim 1, further comprising mounting at least a portion of the leached components to a tool based upon the overall quality of the polycrystalline structure.

17. A method of characterizing a quality of a polycrystalline structure, comprising:

obtaining a leached component comprising a polycrystalline structure, the polycrystalline structure comprising a leached layer and an unleached layer positioned adjacent to the leached layer, the leached layer having at least a portion of a catalyst material removed from therein;

measuring at least one measured capacitance value of the leached component;

measuring at least one measured eddy current value of the leached component;

characterizing a quality of the polycrystalline structure based upon the at least one measured capacitance value of the leached component and upon the at least one measured eddy current value of the leached component, the quality comprising at least one of an estimated leaching depth of the leached component, a relative amount of catalyst remaining within the leached layer, and a relative porosity of the polycrystalline structure of the leached component.

18. The method of claim 17, wherein the leached layer has at least a portion of a by-product material removed from therein.

19. The method of claim 17, further comprising cleaning the polycrystalline structure from one or more by-product materials, wherein the by-product materials were deposited within the polycrystalline structure during a leaching process that removes at least a portion of the catalyst material from therein and forms the leached component.

20. The method of claim 17, further comprising depolarizing the leached component, the depolarizing being performed in at least one of before measuring each measured capacitance value and after measuring each measured capacitance value and in at least one of before measuring each measured eddy current value and after measuring each measured eddy current value.

21. The method of claim 17, further comprising mounting at least a portion of the leached components to a tool based upon the overall quality of the polycrystalline structure.

22. The method of claim 17, wherein the one or more measured eddy current value comprises at least one of an impedance amplitude and a phase angle shift.