PLC SYSTEM FOR AUTOMATICALLY CONTROLLING PID FOR MAINTAINING TARGET WATER QUALITY VALUE BY DEPOSITING WATER TREATMENT CHEMICAL

• US 20130220902A1
• Filed: 01/25/2011
• Published: 08/29/2013
• Est. Priority Date: 11/01/2010
• Status: Abandoned Application

• Current Assignee: Techwin Co., Ltd.
• Original Assignee: Tae I.L. Lee
• Inventors: Lee, Tae Il, Kim, Ho Jin
• Application Number:
  US13/882,562
• Publication Number:
  US 20130220902A1
• Time in Patent Office: Days
• US Class Current: 210/96.1
• CPC Class Codes: C02F 1/008 Control or steering systems not provided for elsewhere in subclass C02F
• CPC Class Codes: C02F 1/685 Devices for dosing the additives
• CPC Class Codes: C02F 1/76 with halogens or compounds of halogens C02F1/4674 takes precedence
• CPC Class Codes: C02F 2209/005 Processes using a programmable logic controller [PLC]
• CPC Class Codes: C02F 2209/006 comprising a software program or a logic diagram
• CPC Class Codes: C02F 2209/29 Chlorine compounds
• CPC Class Codes: C02F 2209/40 Liquid flow rate
• CPC Class Codes: C02F 2303/04 Disinfection
• CPC Class Codes: G05B 11/42 for obtaining a characteristic which is both proportional and time-dependent, e.g. P. I., P. I. D.

Abstract

A PLC system for automatically controlling PID for controlling the target value for residual chemicals in a water treatment facility, according to the present invention, comprises: a PID control software; a main control room computer for generating a PID control command regarding chemical deposit amount and relaying same to a field control PLC in a chemical room; the field control PLC in the chemical room for receiving a PID control command signal from the main control room computer and performing computing and control; and a chemical depositor in the chemical room for receiving the control signal from the field control PCL and depositing the indicated amount of chemicals, wherein the main control room computer calculates an initial setting value for the chemical deposit amount and generates the PID control command.

Claims

1. A PLC system for automatically controlling a PID for maintaining a target water quality value by depositing water treatment chemical, comprising:

a computer provided in a main control room which computer is equipped with a PID control software and generates a PID control command with respect to a chemical feed amount and transfer to a field control PLC of a chemical room;

a field control PLC provided in the chemical room which field control PLC receives a PID control command signal from the computer of the main control room and performs a calculation and control; and

a chemical feeder provided in the chemical room which chemical feeder receives a control signal of the field control PLC and feeds a chemical as much as commanded, and the computer of the main control room calculates an initial set value of the chemical feed amount based on Equation 1 and generates a PID control command,

initial set value=[current actual feed amount+(residual chemical target value−

residual chemical actual measured value)]×

flow amount,  

 

[Equation 1]

where in the equation, the current actual feed amount represents the actual feed ratio of the chemical in comparison to the treatment flow amount, and the residual chemical target value represents a concentration value of the residual chemical targeted after the chemical feed process, and the residual chemical actual measured value represents an actual measured value of the current residual chemical, and the flow amount represents the amount of water which is treated in the chemical feed field.

2. A PLC system for automatically controlling a PID for maintaining a target water quality value by depositing water treatment chemical according to claim 1, wherein the computer of the main control room sets a control range of a PID automatic control which control range is formed of a proportional factor, an integration factor, a calculation period and a compensation deviation which are defined by the capacities of the chemical feeder depending on the water quality for thereby generating a PID control command.

3. A PLC system for automatically controlling a PID for maintaining a target water quality value by depositing water treatment chemical according to claim 1, wherein the computer of the main control room compares at every second the current flow amount with the flow amount of one minute ago, and when the difference between the current flow amount and the flow amount of one minute ago is less than ±

10%, the set value of the current chemical feed amount is maintained identically, and when the difference between the current flow amount and the flow amount of one minute ago is above ±

10%, the flow amount compensation chemical feed set value is recalculated on the basis of Equation 2, for thereby generating a PID control command,

Flow amount compensation chemical feed amount set value=chemical feed amount before change of flow amount+[(current flow amount−

flow amount of one minute ago)×

chemical feed ratio before change of flow amount] 

 

[Equation 2]

4. A PLC system for automatically controlling a PID for maintaining a target water quality value by depositing water treatment chemical according to claim 3, wherein when the flow amount compensation is performed by the flow amount compensation chemical feed amount set value, the flow amount compensation is not performed for one minute.