Method for Forming Dielectric Film Containing Si-C bonds by Atomic Layer Deposition Using Precursor Containing Si-C-Si bond

• US 20130224964A1
• Filed: 02/28/2012
• Published: 08/29/2013
• Est. Priority Date: 02/28/2012
• Status: Abandoned Application

• Current Assignee: ASM IP Holding B.V. (ASM International NV)
• Original Assignee: ASM IP Holding B.V. (ASM International NV)
• Inventors: Fukazawa, Atsuki, Takamure, Noboru
• Application Number:
  US13/406,791
• Publication Number:
  US 20130224964A1
• Time in Patent Office: Days
• US Class Current: 438/765
• CPC Class Codes: C23C 16/325 Silicon carbide
• CPC Class Codes: C23C 16/4554 Plasma being used non-continuously in between ALD reactions C23C16/56 takes precedence
• CPC Class Codes: C23C 16/5096 Flat-bed apparatus
• CPC Class Codes: C23C 16/56 After-treatment
• CPC Class Codes: H01L 21/02167 the material being a silicon carbide not containing oxygen, e.g. SiC, SiC:H or silicon carbonitrides H01L21/02126 and H01L21/0214 take precedence
• CPC Class Codes: H01L 21/02274 in the presence of a plasma [PECVD]
• CPC Class Codes: H01L 21/0228 deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD

Abstract

A method of forming a dielectric film having Si—C bonds on a semiconductor substrate by atomic layer deposition (ALD), includes: (i) adsorbing a precursor on a surface of a substrate; (ii) reacting the adsorbed precursor and a reactant gas on the surface; and (iii) repeating steps (i) and (ii) to form a dielectric film having at least Si—C bonds on the substrate. The precursor has a Si—C—Si bond in its molecule, and the reactant gas is oxygen-free and halogen-free and is constituted by at least a rare gas.

Claims

1. (canceled)

10. (canceled)

15. (canceled)

16. (canceled)

21. A method of forming a dielectric film having Si—

C bonds on a semiconductor substrate by atomic layer deposition (ALD), which comprises;

(i) adsorbing a precursor on a surface of a substrate, said precursor having a Si—

C—

Si bond in its molecule;

(ii) reacting the adsorbed precursor and a reactant gas on the surface,

wherein all the gases used in steps (i) and (ii) are oxygen-free and halogen-free, one of which gases is a rare gas; and

(iii) repeating steps (i) and (ii) to form a conformal dielectric film constituted by a silicon carbide on the substrate,

wherein the semiconductor substrate has patterned recesses on which the dielectric film is formed, each patterned recess including a top surface, side wall, and bottom surface, and the dielectric film has a side wall coverage of at least 75% which is defined as a ratio of thickness of film deposited on the side wall to thickness of film deposited on the top surface, and

wherein the precursor consists of one or more compounds selected from the group consisting of;

2. The method according to claim 21, wherein the reactant gas consists of the rare gas.

3. The method according to claim 21, wherein the reactant gas consists of the rare gas and at least another gas constituted by N, H, and/or C.

4. The method according to claim 3, wherein the other gas is selected from the group consisting of nitrogen, ammonia, hydrogen, hydrocarbon, and nitrogen-hydrocarbon.

5. The method according to claim 4, wherein the other gas is hydrogen and/or nitrogen.

6. The method according to claim 2, wherein the rare gas is at least one rare gas selected from Ar, He, Kr, and Xe.

7. The method according to claim 6, wherein the rare gas is He.

8. The method according to claim 3, wherein the rare gas is at least one rare gas selected from Ar, He, Kr, and Xe.

9. The method according to claim 8, wherein the rare gas is He and the other gas is hydrogen and/or nitrogen.

11. The method according to claim 21, wherein the ALD is plasma enhanced ALD.

12. The method according to claim 11, wherein steps (i) and (ii) comprise:

(a) supplying the precursor and the reactant gas to a reaction space where the substrate is placed, without applying RF power, thereby adsorbing the precursor on the surface of the substrate;

(b) continuously supplying the reactant gas while discontinuing the supply of the precursor, without applying RF power, thereby purging the surface of the substrate;

(c) applying RF power to the reaction space while continuously supplying the reactant gas without the supply of the precursor, thereby reacting the adsorbed precursor and the reactant gas on the surface; and

(d) continuously supplying the reactant gas while discontinuing the supply of the precursor, thereby purging the surface of the substrate,

where steps (a) to (d) constitute one cycle of the plasma enhanced ALD.

13. The method according to claim 21, wherein the ALD is thermal ALD or radical-enhance ALD.

14. The method according to claim 13, wherein steps (i) and (ii) comprise:

(a) supplying the precursor and a dilution gas to a reaction space where the substrate is placed, without supplying the reactant gas, thereby adsorbing the precursor on the surface of the substrate;

(b) continuously supplying the dilution gas while discontinuing the supply of the precursor, without supplying the reactant gas, thereby purging the surface of the substrate;

(c) supplying the reactant gas in an excited state to the reaction space while continuously supplying the dilution gas without the supply of the precursor, thereby reacting the adsorbed precursor and the reactant gas on the surface; and

(d) continuously supplying the dilution gas while discontinuing the supply of the precursor and the reactant gas, thereby purging the surface of the substrate,

where steps (a) to (d) constitute one cycle of the thermal ALD.

17. The method according to claim 3, wherein the dielectric film has a side wall coverage of at least 80%.

18. The method according to claim 21, wherein the dielectric film is constituted by SiCNH or SiCH.

19. The method according to claim 21, further comprising, prior to step (i), treating the surface of the substrate with hydrogen in an excited state.

20. The method according to claim 19, wherein the hydrogen in an excited state is a hydrogen plasma.

22. A method of forming a dielectric film having Si—

C bonds on a semiconductor substrate by atomic layer deposition (ALD), which comprises;

(i) adsorbing a precursor on a surface of a substrate, said precursor having a Si—

C—

Si bond in its molecule;

(ii) reacting the adsorbed precursor and a reactant gas on the surface,

wherein all the gases used in steps (i) and (ii) are oxygen-free and halogen-free, one of which gases is a rare gas; and

(iii) repeating steps (i) and (ii) to form a conformal dielectric film constituted by a silicon carbide on the substrate,

wherein the semiconductor substrate has patterned recesses on which the dielectric film is formed, each patterned recess including a top surface, side wall, and bottom surface, and the dielectric film has a side wall coverage of at least 75% which is defined,as a ratio of thickness of film deposited on the side wall to thickness of film deposited on the top surface, and

wherein all of the reactant gas reacting with the precursor is constituted by predominantly a rare gas in an excited state.