MAGNETIC SENSOR WITH COMPOSITE MAGNETIC SHIELD
First Claim
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1. A method of forming a magneto-resistive reader comprising:
- depositing a first shield element, the first shield element comprising two ferromagnetic anisotropic layers separated by a grain growth suppression layer;
annealing the first shield element at a magnetic set anneal temperature to form a set annealed first shield;
depositing a magneto-resistive sensor stack on the annealed first shield;
annealing the magneto-resistive sensor stack at a magnetic cross set anneal temperature to form a cross set annealed magneto-resistive sensor stack; and
depositing a second shield element on the cross set annealed magneto-resistive sensor stack.
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Abstract
A magneto-resistive reader includes a first magnetic shield element, a second magnetic shield element and a magneto-resistive sensor stack separating the first magnetic shield element from the second magnetic shield element. The first shield element includes two ferromagnetic anisotropic layers separated by a grain growth suppression layer.
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Citations
20 Claims
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1. A method of forming a magneto-resistive reader comprising:
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depositing a first shield element, the first shield element comprising two ferromagnetic anisotropic layers separated by a grain growth suppression layer; annealing the first shield element at a magnetic set anneal temperature to form a set annealed first shield; depositing a magneto-resistive sensor stack on the annealed first shield; annealing the magneto-resistive sensor stack at a magnetic cross set anneal temperature to form a cross set annealed magneto-resistive sensor stack; and depositing a second shield element on the cross set annealed magneto-resistive sensor stack. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method of forming a first shield for a tunneling magneto-resistive reader comprising:
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depositing a first shield element, the first shield element comprising two ferromagnetic anisotropic layers separated by a grain growth suppression layer; annealing the first shield element at a magnetic set anneal temperature to form an set annealed first shield; polishing an exposed surface of the first shield element to form a smooth exposed first shield surface; depositing a chemical mechanical polishing stop layer on the smooth exposed first shield surface; depositing an insulating material about the first shield element; removing insulating material by chemical mechanical polishing down to the chemical mechanical polishing stop layer; and removing the chemical mechanical polishing stop layer, forming a polished first shield element. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification