Semiconductor Devices and Methods of Manufacture Thereof
First Claim
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1. A method of manufacturing a semiconductor device, the method comprising:
- forming a channel region in a workpiece; and
forming a source or drain region proximate the channel region, wherein the source or drain region includes a contact resistance-lowering material layer comprising SiP, SiAs, or a silicide, and wherein the source or drain region includes a channel-stressing material layer comprising SiCP or SiCAs.
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Abstract
Semiconductor devices and methods of manufacture thereof are disclosed. In one embodiment, a method of manufacturing a semiconductor device includes forming a channel region in a workpiece, and forming a source or drain region proximate the channel region. The source or drain region includes a contact resistance-lowering material layer comprising SiP, SiAs, or a silicide. The source or drain region also includes a channel-stressing material layer comprising SiCP or SiCAs.
330 Citations
20 Claims
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1. A method of manufacturing a semiconductor device, the method comprising:
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forming a channel region in a workpiece; and forming a source or drain region proximate the channel region, wherein the source or drain region includes a contact resistance-lowering material layer comprising SiP, SiAs, or a silicide, and wherein the source or drain region includes a channel-stressing material layer comprising SiCP or SiCAs. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of manufacturing a semiconductor device, the method comprising:
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providing a workpiece; forming a channel region in the workpiece; forming a gate dielectric over the channel region; forming a gate over the gate dielectric; and forming a source region and a drain region proximate the channel region, the source region and the drain region including a contact resistance-lowering material layer comprising SiP, SiAs, or a silicide, and the source region and the drain region including a channel-stressing material layer comprising SiCP or SiCAs. - View Dependent Claims (11, 12, 13, 14)
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15. A semiconductor device, comprising:
a transistor including; a channel region disposed in a workpiece; a gate dielectric disposed over the channel region; a gate disposed over the gate dielectric; and a source region and a drain region proximate the channel region, the source region and the drain region including; a contact resistance-lowering material layer comprising SiP, SiAs, or a silicide; and a channel-stressing material layer comprising SiCP or SiCAs. - View Dependent Claims (16, 17, 18, 19, 20)
Specification