ROOM TEMPERATURE NANOWIRE IR, VISIBLE AND UV PHOTODETECTORS

• US 20130240837A1
• Filed: 03/14/2013
• Published: 09/19/2013
• Est. Priority Date: 03/15/2012
• Status: Active Grant

• Current Assignee: Virginia Commonwealth University
• Original Assignee: Virginia Commonwealth University
• Inventors: Bandyopadhyay, Supriyo, Bandyopadhyay, Saumil, Agnihotri, Pratik
• Granted Patent: US 8,946,678 B2
• Time in Patent Office: Days
• US Class Current: 257/21
• CPC Class Codes: H01L 21/02425 Conductive materials, e.g. metallic silicides
• CPC Class Codes: H01L 21/02488 Insulating materials
• CPC Class Codes: H01L 21/02513 Microstructure
• CPC Class Codes: H01L 21/02557 Sulfides
• CPC Class Codes: H01L 21/0256 Selenides
• CPC Class Codes: H01L 21/02562 Tellurides
• CPC Class Codes: H01L 21/02603 Nanowires
• CPC Class Codes: H01L 21/02639 Preparation of substrate for selective deposition
• CPC Class Codes: H01L 31/035227 the quantum structure being quantum wires, or nanorods carbon nanotubes H10K85/211
• CPC Class Codes: H01L 31/035236 Superlattices; Multiple quantum well structures
• CPC Class Codes: H01L 31/09 Devices sensitive to infrared, visible or ultraviolet radiation H01L31/101 takes precedence
• CPC Class Codes: H01L 31/101 Devices sensitive to infrared, visible or ultraviolet radiation
• CPC Class Codes: H01L 31/109 the potential barrier being of the PN heterojunction type
• CPC Class Codes: H01L 31/18 Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
• CPC Class Codes: H01L 31/1836 comprising a growth substrate not being an AIIBVI compound
• CPC Class Codes: Y02E 10/50 Photovoltaic [PV] energy

Abstract

Room temperature IR and UV photodetectors are provided by electrochemical self-assembly of nanowires. The detectivity of such IR detectors is up to ten times better than the state of the art. Broad peaks are observed in the room temperature absorption spectra of 10-nm diameter nanowires of CdSe and ZnS at photon energies close to the bandgap energy, indicating that the detectors are frequency selective and preferably detect light of specific frequencies. Provided is a photodetector comprising: an aluminum substrate; a layer of insulator disposed on the aluminum substrate and comprising an array of columnar pores; a plurality of semiconductor nanowires disposed within the pores and standing vertically relative to the aluminum substrate; a layer of nickel disposed in operable communication with one or more of the semiconductor nanowires; and wire leads in operable communication with the aluminum substrate and the layer of nickel for connection with an electrical circuit.

Claims

1. A photodetector comprising:

an array of semiconductor nanowires either standing vertically on a conducting substrate and capped by a conductor transparent to light, or lying horizontally on a non-conducting substrate and capped by conductors at both ends; and

wire leads attached to the conductors and conducting substrate for connection to an electrical circuit.

2. The photodetector of claim 1, wherein the semiconductor nanowires have a diameter of from 5-50 nm.

3. The photodetector of claim 1, wherein the semiconductor nanowires comprise any direct bandgap semiconductor of bandgap energy between 0.3 eV and 4 eV or direct bandgap insulator of bandgap between 4 and 10 eV.

4. The photodetector of claim 1, wherein the nanowires are fabricated by self-assembly, or nanolithography, or combinations thereof.

5. The photodetector of claim 1, wherein an insulating layer is disposed between the semiconductor nanowires and one of the conductors or the conducting substrate at one end.

6. The photodetector of claim 5, wherein the insulating layer is alumina of thickness ranging from above 0 to 20 nm.

7. The photodetector of claim 5, wherein the insulating layer during use acts as a tunnel barrier through which electrons excited by IR, visible or UV light into the conduction band will have to tunnel.

8. The photodetector of claim 1 capable of detecting IR, UV, or IR and UV light.

9. The photodetector of claim 5 capable of detecting IR, UV, or IR and UV light.

10. The photodetector of claim 1, wherein the wire leads are any conductor.

11. The photodetector of claim 5, wherein the wire leads are any conductor.

12. The photodetector of claim 1 capable of an infrared detectivity at room temperature ranging from 1×

10⁵ Jones to 1×

10⁸ Jones.

13. The photodetector of claim 5 capable of an infrared detectivity at room temperature ranging from 1×

10⁵ Jones to 1×

10⁸ Jones.

14. The photodetector of claim 1, wherein when exposed to IR light, electrons in the semiconductor nanowires are excited from trap states to the conduction band and when exposed to visible or UV light, electrons are excited from valence to conduction band.

15. The photodetector of claim 5, wherein when exposed to IR light, electrons in the semiconductor nanowires are excited from trap states to the conduction band and when exposed to visible or UV light, electrons are excited from valence to conduction band.

16. The photodetector of claim 5, wherein when exposed to IR, visible or UV light, electrons are excited into the conduction band from either trap states or the valence band;

said electrons lower tunnel barrier height and increase current, leading to detection of IR, visible or UV light.

17. The photodetector of claim 5, wherein the insulator layer is a tunnel barrier that during use introduces resistance in the path of the current thus reducing the dark current.

18. The photodetector of claim 5, wherein the tunnel barrier introduces resistance in the path of the current thus reducing standby energy dissipation.

19. The photodetector of claim 1, wherein wavefunction engineering is employed to excite electrons from a state with localized wavefunction to a state with delocalized wavefunction.

20. The photodetector of claim 5, wherein wavefunction engineering is employed to excite electrons from a state with localized wavefunction to a state with delocalized wavefunction.

21. A method of making a photodetector comprising:

providing an aluminum foil with a thickness between 0-1 mm;

degreasing and electropolishing the foil to reduce surface roughness;

optionally rinsing the foil in distilled water,

anodizing the aluminum foil in sulfuric, oxalic or phosphoric acid to create a nanoporous alumina film, with columnar pores on a surface of the aluminum foil;

stripping off the alumina film using hot chromic/phosphoric acid;

repeating the anodizing until an alumina film with a desired thickness is obtained;

removing or reducing thickness of any alumina barrier present between the aluminum foil and the bottom of the pores using step anodization, reverse polarity etching, soaking in phosphoric acid, or combinations thereof;

depositing semiconductor material into at least some of the columnar pores to obtain an array of semiconductor nanowires vertically disposed with respect to the aluminum foil;

depositing a layer of optically transparent conductive material on top of the alumina film; and

attaching wire leads to the layer of optically transparent conductive material and the aluminum substrate.