TRANSISTOR ARRAY WITH A MOSFET AND MANUFACTURING METHOD
First Claim
16. A MOSFET, comprising:
- a semiconductor body having a source region, a drift region and a drain region having a first conductivity type and a body region having a second conductivity type, the body region being between the source region and the drift region;
a gate electrode disposed adjacent the body region, the gate electrode being isolated by a gate dielectric;
a source electrode which contacts the source region and the body region; and
a channel region of the first conductivity type extending from the source electrode to the drift region, so that a pn junction between the body region and the channel region is provided, wherein a doping concentration of the body region and a width of the channel region are such that the intrinsic depletion zone of the channel region cuts off when the MOSFET is in a non-biased state.
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Abstract
Disclosed are a semiconductor device and a method for producing a semiconductor device. A MOSFET may have a source region, a drift region and a drain region of a first conductivity type, a body region of a second conductivity type disposed between the source region and the drift region, and a gate electrode disposed adjacent to said body region. The gate electrode may be isolated from the body region by a dielectric, and have a source electrode contacting the source region and the body region. A self-locking JFET, associated with the MOSFET, may have a channel region of the first conductivity type, the channel region connected between the source electrode and the drift region, and coupled to and adjacent the body region.
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Citations
26 Claims
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16. A MOSFET, comprising:
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a semiconductor body having a source region, a drift region and a drain region having a first conductivity type and a body region having a second conductivity type, the body region being between the source region and the drift region; a gate electrode disposed adjacent the body region, the gate electrode being isolated by a gate dielectric; a source electrode which contacts the source region and the body region; and a channel region of the first conductivity type extending from the source electrode to the drift region, so that a pn junction between the body region and the channel region is provided, wherein a doping concentration of the body region and a width of the channel region are such that the intrinsic depletion zone of the channel region cuts off when the MOSFET is in a non-biased state. - View Dependent Claims (17, 18, 19)
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21. A method of manufacturing a semiconductor device, comprising:
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providing a semiconductor body having a drift region of a first conductivity type, a body region having a second conductivity type that is complementary to the first conductivity type, the body region being adjacent to the drift region, a source region having the first conductivity type and adjacent to the body region, and a gate electrode adjacent to the body region, the gate electrode isolated from the body region by a gate dielectric; forming a channel region in the body region and spaced from the gate dielectric, wherein the channel region extends up from the drift region to the source region; producing at least one trench in the source region, the body region and the channel region, a first sidewall of the trench adjacent to the body region and a second sidewall of the trench, opposite of the first sidewall, adjacent to the channel region; forming a depletion control region having the second conductivity type, the depletion control region being adjacent to the trench, at least in the channel region and spaced from the source region; and forming a source electrode in the trench. - View Dependent Claims (1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 20, 24, 25)
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24-1. The method according to claim 21, wherein forming the channel region comprises utilizing an implantation and/or diffusion process.
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25-2. The method according to claim 21, wherein the producing of the at least one trench comprises using an etch mask, the etch mask remaining after forming the at least one trench.
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26. The method according to claim 26, further comprising:
forming a drain region of the first conductivity type, the drain region at least spaced apart from the body region.
Specification