SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
First Claim
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1. A method for manufacturing a semiconductor device, comprising the steps of:
- forming a first conductive layer and a second conductive layer over a substrate;
forming a first layer over the first conductive layer and a second layer over the second conductive layer;
forming an oxide semiconductor layer over the first layer and the second layer;
forming an insulating layer over the oxide semiconductor layer; and
forming a third conductive layer over the insulating layer,wherein a carrier concentration of each of the first layer and the second layer is higher than a carrier concentration of the oxide semiconductor layer,wherein the oxide semiconductor layer and the first conductive layer are electrically connected to each other with the first layer interposed therebetween, andwherein the oxide semiconductor layer and the second conductive layer are electrically connected to each other with the second layer interposed therebetween.
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Abstract
An embodiment is to include a staggered (top gate structure) thin film transistor in which an oxide semiconductor film containing In, Ga, and Zn is used as a semiconductor layer and a buffer layer is provided between the semiconductor layer and a source and drain electrode layers. A metal oxide layer having higher carrier concentration than the semiconductor layer is provided intentionally as the buffer layer between the source and drain electrode layers and the semiconductor layer, whereby an ohmic contact is formed.
22 Citations
19 Claims
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1. A method for manufacturing a semiconductor device, comprising the steps of:
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forming a first conductive layer and a second conductive layer over a substrate; forming a first layer over the first conductive layer and a second layer over the second conductive layer; forming an oxide semiconductor layer over the first layer and the second layer; forming an insulating layer over the oxide semiconductor layer; and forming a third conductive layer over the insulating layer, wherein a carrier concentration of each of the first layer and the second layer is higher than a carrier concentration of the oxide semiconductor layer, wherein the oxide semiconductor layer and the first conductive layer are electrically connected to each other with the first layer interposed therebetween, and wherein the oxide semiconductor layer and the second conductive layer are electrically connected to each other with the second layer interposed therebetween. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method for manufacturing a semiconductor device, comprising the steps of:
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forming a source electrode layer and a drain electrode layer over a substrate; forming a first metal oxide layer having n-type conductivity over the source electrode layer and a second metal oxide layer having n-type conductivity over the drain electrode layer; forming an oxide semiconductor layer over the first metal oxide layer and the second metal oxide layer; forming a gate insulating layer over the oxide semiconductor layer; and forming a gate electrode layer over the gate insulating layer, wherein a carrier concentration of each of the first metal oxide layer and the second metal oxide layer is higher than a carrier concentration of the oxide semiconductor layer, wherein the oxide semiconductor layer and the source electrode layer are electrically connected to each other with the first metal oxide layer interposed therebetween, and wherein the oxide semiconductor layer and the drain electrode layer are electrically connected to each other with the second metal oxide layer interposed therebetween. - View Dependent Claims (9, 10, 11, 12, 13)
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14. A method for manufacturing a semiconductor device, comprising the steps of:
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forming a source electrode layer and a drain electrode layer over a substrate; forming a first metal oxide layer having n-type conductivity over the source electrode layer and a second metal oxide layer having n-type conductivity over the drain electrode layer; forming an oxide semiconductor layer over the first metal oxide layer and the second metal oxide layer; forming a gate insulating layer over the oxide semiconductor layer; and forming a gate electrode layer over the gate insulating layer, wherein a carrier concentration of each of the first metal oxide layer and the second metal oxide layer is higher than a carrier concentration of the oxide semiconductor layer, wherein the oxide semiconductor layer and the source electrode layer are electrically connected to each other with the first metal oxide layer interposed therebetween, wherein the oxide semiconductor layer and the drain electrode layer are electrically connected to each other with the second metal oxide layer interposed therebetween, and wherein the oxide semiconductor layer, the gate insulating layer, and the gate electrode layer are successively formed without exposure to air. - View Dependent Claims (15, 16, 17, 18, 19)
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Specification