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SYSTEM AND METHOD FOR CLEANING SURFACES AND COMPONENTS OF MASK AND WAFER INSPECTION SYSTEMS BASED ON THE POSITIVE COLUMN OF A GLOW DISCHARGE PLASMA

  • US 20130255717A1
  • Filed: 03/28/2013
  • Published: 10/03/2013
  • Est. Priority Date: 04/03/2012
  • Status: Abandoned Application
First Claim
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1. An apparatus comprising:

  • a wafer or mask inspection chamber configured to receive an electrical waveform and to conduct the electrical waveform to conductive surfaces of the wafer or mask inspection chamber;

    a source of gas associated with the wafer or mask inspection chamber;

    a vacuum system associated with the wafer or mask inspection chamber;

    a power system associated with the wafer or mask inspection chamber;

    an anode associated with the wafer or mask inspection chamber; and

    a cathode associated with the wafer or mask inspection chamber, the anode and cathode are configured such that when a voltage is applied between the anode and the cathode in a presence of the gas at vacuum conditions, a positive column of a glow discharge plasma forms near the anode and the positive column is used to clean the wafer or mask inspection chamber surfaces based on the electrical waveform.

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