X-RAY TOPOGRAPHY APPARATUS

• US 20130259200A1
• Filed: 03/18/2013
• Published: 10/03/2013
• Est. Priority Date: 04/02/2012
• Status: Active Grant

• Current Assignee: Rigaku Corporation
• Original Assignee: Rigaku Corporation
• Inventors: OMOTE, Kazuhiko, UEJI, Yoshinori, KIKUCHI, Tetsuo, MATSUO, Ryuji
• Granted Patent: US 9,335,282 B2
• Time in Patent Office: Days
• US Class Current: 378/74
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: G01N 23/207 Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
• CPC Class Codes: G21K 1/062 Devices having a multilayer structure

Abstract

Provided is an X-ray topography apparatus capable of separating a desired characteristic X-ray which enters a sample from an X-ray which is radiated from an X-ray source, and increasing an irradiation region of the desired characteristic X-ray. The X-ray topography apparatus includes: the X-ray source for radiating the X-ray from a fine focal point, the X-ray containing a predetermined characteristic X-ray; an optical system including a multilayer mirror with a graded multilayer spacing which corresponds to the predetermined characteristic X-ray, the optical system being configured to cause the X-ray reflected on the multilayer mirror to enter the sample; and an X-ray detector for detecting a diffracted X-ray. The multilayer mirror includes a curved reflective surface having a parabolic cross section, and the fine focal point of the X-ray source is provided onto a focal point of the curved reflective surface.

Claims

1. An X-ray topography apparatus, comprising:

an X-ray source for radiating an X-ray from a fine focal point, the X-ray containing a predetermined characteristic X-ray;

an optical system comprising a multilayer mirror with a graded multilayer spacing which corresponds to the predetermined characteristic X-ray, the optical system being configured to cause the X-ray reflected on the multilayer mirror to enter a sample; and

an X-ray detector for detecting a diffracted X-ray, which is generated through the sample,

wherein the multilayer mirror comprises a curved reflective surface having a parabolic cross section, and the fine focal point of the X-ray source is provided onto a focal point of the curved reflective surface.

2. The X-ray topography apparatus according to claim 1, further comprising a rotational driving system having the X-ray source and the optical system arranged thereon, the rotational driving system being rotationally movable with respect to the sample,

wherein the rotational driving system is configured to move the X-ray source and the optical system through selection of one of a transmission geometry for transmission topography and a reflection geometry for reflection topography, and to further move the X-ray source and the optical system in the selected one of the transmission geometry and the reflection geometry so that the X-ray satisfies a desired diffraction condition with respect to the sample.

3. The X-ray topography apparatus according to claim 1, wherein the optical system further comprises a single crystal monochromator arranged between the multilayer mirror and the sample, the single crystal monochromator corresponding to a wavelength of the predetermined characteristic X-ray.

4. The X-ray topography apparatus according to claim 1, wherein the multilayer mirror has a surface accuracy of 10 arcsec or less.