TRANSPARENT MEMBER, TIMEPIECE, AND METHOD OF MANUFACTURING A TRANSPARENT MEMBER

• US 20130260115A1
• Filed: 05/21/2013
• Published: 10/03/2013
• Est. Priority Date: 07/31/2008
• Status: Abandoned Application

• Current Assignee: Seiko Epson Corporation (Seiko Group)
• Original Assignee: Seiko Epson Corporation (Seiko Group)
• Inventors: SUZUKI, Katsumi, SUZUKI, Keiichi, SEKI, Hiroyuki
• Application Number:
  US13/898,761
• Publication Number:
  US 20130260115A1
• Time in Patent Office: Days
• US Class Current: 428/212
• CPC Class Codes: C03C 17/3435 comprising a nitride, oxynitride, boronitride or carbonitride
• CPC Class Codes: C03C 17/42 at least one coating of an organic material and at least one non-metal coating
• CPC Class Codes: C03C 2217/734 comprising an alternation of high and low refractive indexes
• CPC Class Codes: C03C 2217/78 Coatings specially designed to be durable, e.g. scratch-resistant
• CPC Class Codes: C23C 14/0652 Silicon nitride
• CPC Class Codes: C23C 14/10 Glass or silica
• CPC Class Codes: C23C 14/12 Organic material
• CPC Class Codes: G02B 1/115 Multilayers
• CPC Class Codes: G04B 39/00 Watch crystals; Fastening or sealing of crystals; Clock glasses
• CPC Class Codes: Y10T 428/24942 including components having same physical characteristic in differing degree
• CPC Class Codes: Y10T 428/265 1 mil or less
• CPC Class Codes: Y10T 428/31663 As siloxane, silicone or silane

Abstract

A transparent member has a transparent substrate, and an antireflection coating that has a high index of refraction layer made of silicon nitride and a low index of refraction layer made of silicon oxide alternately laminated on at least a part of a surface of the substrate. The content of silicon nitride in the region to a depth of 150 nm from the outside surface of the antireflection coating is 30-50 vol %.

Claims

1. A transparent member comprising:

a transparent substrate; and

an antireflection coating that has a high index of refraction layer made of silicon nitride and a low index of refraction layer made of silicon oxide alternately laminated on at least a part of a surface of the substrate,

the content of silicon nitride in the region to a depth of 150 nm from the outside surface of the antireflection coating being 34-50 vol %.