ELECTROSTATIC CHUCK APPARATUS

• US 20130265690A1
• Filed: 12/18/2012
• Published: 10/10/2013
• Est. Priority Date: 06/21/2011
• Status: Active Grant

• Current Assignee: Sumitomo Osaka Cement Company Limited
• Original Assignee: Sumitomo Osaka Cement Company Limited
• Inventors: Moriya, Yoshiaki, Furuuchi, Kei, Maeta, Shinichi
• Granted Patent: US 9,837,296 B2
• Time in Patent Office: Days
• US Class Current: 361/234
• CPC Class Codes: H01L 21/67248 Temperature monitoring
• CPC Class Codes: H01L 21/6831 using electrostatic chucks

Abstract

An electrostatic chuck apparatus is disclosed which can be prevented from being damaged or fractured when the temperature abruptly increases or decreases when plasma is irradiated on a plate-like specimen, the heater is heated, or the like, and can also prevent corrosion when a corrosive gas or plasma is provided. The electrostatic chuck apparatus has an electrostatic chuck portion 2 having a mounting plate 11 made of a corrosion-resistant ceramic, a supporting plate 12 which is integrated with the mounting plate 11 so as to support the mounting plate 11 and is made of an insulating ceramic having a larger thermal conductivity than the thermal conductivity of the corrosion-resistant ceramic, and an internal electrode for electrostatic adsorption 13 provided between the mounting plate 11 and the supporting plate 12; and a temperature-controlling base portion 3 which adjusts the electrostatic chuck portion 2 to a desired temperature.

Claims

1. An electrostatic chuck apparatus comprising:

an electrostatic chuck portion having a mounting plate made of a corrosion-resistant ceramic which has one main surface used as a mounting surface on which a plate-like specimen is mounted, a supporting plate which is integrated with the mounting plate so as to support the mounting plate and is made of an insulating ceramic having a larger thermal conductivity than the corrosion-resistant ceramic, and an internal electrode for electrostatic adsorption provided between the mounting plate and the supporting plate; and

a temperature-controlling base portion which adjusts the electrostatic chuck portion to a desired temperature.

2. The electrostatic chuck apparatus according to claim 1,

wherein the corrosion-resistant ceramic is composed of one or more selected from a group of yttrium aluminum oxide composite oxides, rare earth element-added yttrium aluminum oxide composite oxides, and yttrium oxides.

3. The electrostatic chuck apparatus according to claim 1,

wherein heating members are provided between the supporting plate and the temperature-controlling base portion, and the heating members are embedded in an organic insulating adhesive layer.

4. The electrostatic chuck apparatus according to claim 2,

wherein heating members are provided between the supporting plate and the temperature-controlling base portion, and the heating members are embedded in an organic insulating adhesive layer.

5. The electrostatic chuck apparatus according to claim 1,

wherein a thickness of the mounting plate is 0.3 mm to 2.0 mm.

6. The electrostatic chuck apparatus according to claim 2,

wherein a thickness of the mounting plate is 0.3 mm to 2.0 mm.

7. The electrostatic chuck apparatus according to claim 3,

wherein a thickness of the mounting plate is 0.3 mm to 2.0 mm.