SHOWER HEAD APPARATUS AND METHOD FOR CONTROLLIGN PLASMA OR GAS DISTRIBUTION
First Claim
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1. An apparatus, comprising:
- a shower head configured to be mounted inside a chamber and provide a processing gas onto a semiconductor wafer inside the chamber, the shower head having a supply plenum for supplying the gas to the chamber and a vacuum manifold fluidly coupled to the supply plenum; and
at least one vacuum system fluidly coupled to the vacuum manifold of the shower head.
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Abstract
An apparatus comprises: a shower head having a supply plenum for supplying the gas to the chamber and a vacuum manifold fluidly coupled to the supply plenum; and at least one vacuum system fluidly coupled to the vacuum manifold of the shower head.
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Citations
20 Claims
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1. An apparatus, comprising:
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a shower head configured to be mounted inside a chamber and provide a processing gas onto a semiconductor wafer inside the chamber, the shower head having a supply plenum for supplying the gas to the chamber and a vacuum manifold fluidly coupled to the supply plenum; and at least one vacuum system fluidly coupled to the vacuum manifold of the shower head. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A semiconductor equipment system, comprising:
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a processing chamber; and an apparatus for providing a processing gas onto a semiconductor wafer inside the processing chamber, the apparatus comprising; a shower head configured to be mounted inside the processing chamber, the shower head having a supply plenum for supplying the gas to the chamber and a vacuum manifold fluidly coupled to the supply plenum; and at least one vacuum system fluidly coupled to the vacuum manifold of the shower head. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18)
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19. A method of semiconductor processing, comprising:
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feeding at least one chemical in a gas state into a processing chamber through a shower head, the shower head having a supply plenum for supplying the gas to the chamber; and applying vacuum to a portion of the supply plenum of the shower head. - View Dependent Claims (20)
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Specification