Substrate Cleaning System Using Stabilized Fluid Solutions

• US 20130284217A1
• Filed: 06/28/2013
• Published: 10/31/2013
• Est. Priority Date: 12/30/2005
• Status: Abandoned Application

• Current Assignee: Lam Research Corporation
• Original Assignee: Lam Research Corporation
• Inventors: de Larios, John M., Ravkin, Michael, Korolik, Mikhail, Mikhaylichenko, Katrina, Redeker, Fred C., Freer, Erik M.
• Application Number:
  US13/931,376
• Publication Number:
  US 20130284217A1
• Time in Patent Office: Days
• US Class Current: 134/184
• CPC Class Codes: B05D 3/10 by other chemical means
• CPC Class Codes: C11D 17/0004 Non aqueous liquid compositions comprising insoluble particles
• CPC Class Codes: C11D 17/0013 Liquid compositions with insoluble particles in suspension C11D17/0021, C11D17/0026, C11D17/003 take precedence
• CPC Class Codes: C11D 2111/22 Electronic devices, e.g. PCBs or semiconductors
• CPC Class Codes: C11D 3/14 Fillers; Abrasives ; Abrasive compositions; Suspending or absorbing agents not provided for in one single group of C11D3/12; Specific features concerning abrasives, e.g. granulometry or mixtures dyes, pigments C11D3/40
• CPC Class Codes: C23G 1/00 Cleaning or pickling metallic material with solutions or molten salts with organic solvents C23G5/02
• CPC Class Codes: G03F 7/42 Stripping or agents therefor
• CPC Class Codes: H01L 21/02052 Wet cleaning only H01L21/02085 takes precedence
• CPC Class Codes: H01L 21/02057 Cleaning during device manufacture
• CPC Class Codes: H01L 21/02096 only mechanical cleaning
• CPC Class Codes: H01L 21/67051 using mainly spraying means, e.g. nozzles
• CPC Class Codes: H01L 21/6715 Apparatus for applying a liquid, a resin, an ink or the like H01L21/67126 takes precedence

Abstract

A substrate cleaning systems are provided. One system includes a proximity head system for applying a meniscus to a surface of a substrate during a cleaning operation. Also provided is a container for holding the solution, the solution being mixed from at least a continuous medium, a polymer material, and a solid material, the polymer material in the solution imparting a finite yield stress to the material, such that the solution is maintained in a stable elastic gel form. A pump coupled to the container is also provided for moving the solution from the container to the proximity head system, where the pump applies at least a minimum shear stress on the solution. The pump provides agitation that exceeds the finite yield stress causing the solution to flow. A conduit is provided between the container and the proximity head system.

Claims

1. A substrate cleaning system, comprising:

a proximity head system for applying a meniscus to a surface of a substrate during a cleaning operation, the meniscus being defined by a solution;

a container holding the solution, the solution being mixed from at least a continuous medium, a polymer material, and a solid material, the polymer material in the solution imparting a finite yield stress to the material, such that the solution is maintained in a stable elastic gel form, the stable elastic gel form being configured to hold the solid material form in place and prevent the solid material from fluid flow in the solution if stresses less than the finite yield stress is imparted on the solid material after synthesis of the solution and during any storage of the solution;

a pump for moving the solution from the container to the proximity head system, the pump applies at least a minimum shear stress on the solution, and the pump provides agitation that exceeds the finite yield stress causing the solution to flow;

a head of the proximity head system receiving the solution that is configured to be applied to the surface of the substrate in the form of the meniscus.

2. A substrate cleaning system as recited in claim 1, wherein the meniscus is in a fluid form or a foam form.

3. A substrate cleaning system as recited in claim 1, further comprising,

a foam generation system that transforms the solution into tri-state bodies, the tri-state bodies being defined by a part fluid, a part gas, and a part solids.

4. A substrate cleaning system, comprising:

a proximity head system for applying a meniscus to a surface of a substrate during a cleaning operation, the proximity head system having a body and a surface with a plurality of conduits, the surface being configured for placement proximate to the substrate when present, the plurality of conduits of the proximity head system having an input for receiving a solution and moving the solution internally of the body within the proximity head and to the plurality of conduits for delivery of the solution to the substrate when present, the solution being delivered in a form of the meniscus disposed between the surface of the proximity head system and the substrate when present;

a container for holding the solution, the solution being mixed from at least a continuous medium, a polymer material, and a solid material, the polymer material in the solution imparting a finite yield stress to the material, such that the solution is maintained in a stable elastic gel form;

a pump coupled to the container for moving the solution from the container to the proximity head system, the pump applies at least a minimum shear stress on the solution, and the pump provides agitation that exceeds the finite yield stress causing the solution to flow; and

a conduit defined between the container and the proximity head system, such that the solution is provided to the input of the proximity head system for application to the surface of the substrate in the form of the meniscus.

5. A substrate cleaning system as recited in claim 4, wherein the meniscus is in a fluid form or a foam form.

6. A substrate cleaning system as recited in claim 4, further comprising,

a foam generation system that transforms the solution into tri-state bodies, the tri-state bodies being defined by a part fluid, a part gas, and a part solids.

7. A substrate cleaning system as recited in claim 4, further comprising,

a foam generation system disposed between the pump and the proximity head system, such that the foam generation system transforms the solution into tri-state bodies.

8. A substrate cleaning system as recited in claim 7, wherein the tri-state bodies are defined by a part fluid, a part gas, and a part solids.

9. A substrate cleaning system as recited in claim 4, wherein the pump includes a shear thinning mechanism.

10. A substrate cleaning system as recited in claim 4, wherein the stable elastic gel form being configured to hold the solid material form in place and prevent the solid material from fluid flow in the solution if stresses less than the finite yield stress is imparted on the solid material after synthesis of the solution and during any storage of the solution.

11. A substrate cleaning system, comprising:

a jet application system for applying a solution to a surface of a substrate during a cleaning operation;

a container holding the solution, the solution being mixed from at least a continuous medium, a polymer material, and solid material, the polymer material in the solution imparting a finite yield stress to the material, such that the solution is maintained in a stable elastic gel form, the stable elastic gel form being configured to hold the solid material form in place and prevent the solid material from moving in the solution if stresses less than the finite yield stress is imparted on the solid material after synthesis of the solution and during any storage of the solution; and

a pump for moving the solution from the container to the jet application system, the pump applies at least a minimum shear stress on the solution, and the pump provides agitation that exceeds the finite yield stress causing the solution to flow;

wherein the jet sprays the solution to the surface of the substrate so as to remove unwanted contaminants.

12. A substrate cleaning system 11, wherein the jet applies a stream of the solution on the surface of the substrate.