METHOD AND COMPUTER-AIDED DESIGN SYSTEM OF MANUFACTURING AN OPTICAL SYSTEM

• US 20130297061A1
• Filed: 05/03/2012
• Published: 11/07/2013
• Est. Priority Date: 05/03/2012
• Status: Abandoned Application

• Current Assignee: National Taiwan University (Government of The Republic of China)
• Original Assignee: National Taiwan University (Government of The Republic of China)
• Inventors: Tsai, Kuen-Yu, Chen, Sheng-Yung, Chen, Shin-Chuan
• Application Number:
  US13/463,685
• Publication Number:
  US 20130297061A1
• Time in Patent Office: Days
• US Class Current: 700/103
• CPC Class Codes: G03F 7/705 Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
• CPC Class Codes: G03F 7/70591 Testing optical components
• CPC Class Codes: G03F 7/70975 Assembly, maintenance, transport or storage of apparatus
• CPC Class Codes: H01J 2237/1205 Microlenses
• CPC Class Codes: H01J 37/3007 Electron or ion-optical systems electron or ion-optical details H01J37/06 - H01J37/153
• CPC Class Codes: H01J 37/3174 Particle-beam lithography, e.g. electron beam lithography

Abstract

A method of manufacturing an optical system is described. The method comprises designing at least one performance specification for an optical system, defining at least one fabrication parameter of a component of the optical system, fabricating the component according to the at least one fabrication parameter, obtaining at least one fabrication error of the component during the fabrication process, predicting at least one operation performance of the optical system by simulating with the at least one fabrication error, determining whether the operation performance corresponds with the at least one performance specification, and repeating fabricating the component by using at least one new parameter if the operation performance does not correspond with the at least one performance specification.

Claims

1. A method of manufacturing an optical system, the method comprising:

defining at least one performance specification for an optical system;

defining at least one fabrication parameter of a component of the optical system;

fabricating the component according to the at least one fabrication parameter;

obtaining at least one fabrication error of the component during the fabrication process if a measured parameter of the fabricated component deviates from the at least one fabrication parameter;

predicting at least one operation performance value of the optical system by simulating fabrication with the at least one fabrication error;

determining whether the at least one operation performance value corresponds with the at least one performance specification; and

repeating fabricating the component by using at least one new parameter if the at least one operation performance value does not correspond with at least one the performance specification.

2. The method according to claim 1, further comprising assembling and testing the optical system if the at least one operation performance value corresponds with the at least one performance specification.

3. The method according to claim 1, wherein the optical system is a wave optical system or a particle optical system.

4. The method according to claim 1, wherein the optical system is a zone plate array lithography system.

5. The method according to claim 4, wherein the at least one performance specification comprises an acceptable range of a beam spot size or a lithography line width.

6. The method according to claim 4, wherein the component comprises a diffractive-optical element.

7. The method according to claim 6, wherein the at least one fabrication parameter comprises a zone number or a focal distance of the diffractive-optical element.

8. The method according to claim 1, wherein the at least one fabrication error is obtained by measuring during the fabrication process.

9. The method according to claim 1, wherein the at least one fabrication error comprises a zone-width variation or an etching depth variation.

10. The method according to claim 1, wherein the optical system is a charged-particle optical system.

11. The method according to claim 10, wherein the at least one performance specification comprises an acceptable range of a beam spot size, a working distance, a lithography line width, or a depth of focus.

12. The method according to claim 10, wherein the component comprises a charged-particle-optical-objective lens.

13. The method according to claim 11, wherein the at least one fabrication parameter comprises a thickness or a bore diameter of the charged-particle-optical-objective lens.

14. The method according to claim 13, wherein the at least one fabrication error results from an imperfect laser energy distribution, or etching time.

15. The method according to claim 14, wherein the at least one fabrication error comprises a non-vertical hole profile or a substrate topography variation.

16. The method according to claim 1, wherein the at least one fabrication parameter is obtained by simulation according to the at least one performance specification.

17. The method according to claim 1, wherein the at least one fabrication parameter is obtained by a mathematic operation according to the empirical value.

18. A computer-aided design system of manufacturing an optical system, the system comprising:

an input unit configured to receive at least one performance specification and at least one fabrication parameter of a component of the optical system;

a memory unit;

a processing unit connected to the input unit and the memory unit and configured to store the at least one performance specification and the at least one fabrication parameter in the memory unit;

a transmitting unit connected to the processing unit and configured to transmit the at least one fabrication parameter to a manufactory and receive at least one fabrication error of the component during the fabrication process from the manufactory if a measured parameter of the fabricated component deviates from the at least one fabrication parameter; and

a simulation module connected to the processing unit and configured to simulate with the at least one fabrication error to predict an operation performance value of the optical system;

wherein the processing unit is configured to determine whether the operation performance value corresponds with the at least one performance specification, and output an indicating signal to the manufactory via the transmitting unit.

19. The system according to claim 18, wherein the indicating signal is configured to instruct the manufactory to repeat fabricating the component by at least one new fabrication parameter if the operation performance value does not correspond with the at least one performance specification.

20. The system according to claim 18, wherein the indicating signal is configured to instruct the manufactory to assemble and test the optical system if the operation performance value corresponds with the at least one performance specification.