×

PATTERN SELECTION FOR FULL-CHIP SOURCE AND MASK OPTIMIZATION

  • US 20130311958A1
  • Filed: 05/07/2013
  • Published: 11/21/2013
  • Est. Priority Date: 10/28/2009
  • Status: Active Grant
First Claim
Patent Images

1. A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate, the method comprising:

  • selecting a subset of patterns from the portion of the design layout; and

    simultaneously reconfiguring an illumination source and the portion of the design layout to improve the lithographic process, wherein the reconfiguration of the illumination source is based on the subset of patterns, and the resulting configuration of the illumination source achieves a desired imaging performance for the portion of the design layout,wherein one or more of the above steps are performed by the computer.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×