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PLASMA CHAMBER HAVING AN UPPER ELECTRODE HAVING CONTROLLABLE VALVES AND A METHOD OF USING THE SAME

  • US 20130319612A1
  • Filed: 06/01/2012
  • Published: 12/05/2013
  • Est. Priority Date: 06/01/2012
  • Status: Active Grant
First Claim
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1. A plasma treatment apparatus comprising:

  • a vapor chamber;

    an upper electrode assembly comprising;

    a gas distribution plate having a plurality of holes in a bottom surface thereof; and

    an upper electrode having at least one gas nozzle and at least one controllable valve connected to the at least one gas nozzle for controlling a flow of gas from a gas supply to the holes via the at least one gas nozzle; and

    a controller configured to generate a control signal,wherein the at least one controllable valve is configured to be adjusted based on the control signal.

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