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PASSIVE POWER DISTRIBUTION FOR MULTIPLE ELECTRODE INDUCTIVE PLASMA SOURCE

  • US 20130320853A1
  • Filed: 11/19/2012
  • Published: 12/05/2013
  • Est. Priority Date: 02/02/2009
  • Status: Active Grant
First Claim
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1. A method for controlling a spatial distribution of plasma in a processing chamber that includes a primary inductor and N secondary inductors, comprising:

  • exciting the plasma in the processing chamber with the primary inductor;

    inductively coupling the primary inductor to each of N secondary inductors through the plasma, wherein N is equal to or greater than one; and

    terminating each of the N secondary inductors such that substantially all current that passes through each of the N secondary inductors results from mutual inductance through the plasma with the primary inductor, the current through each of the N secondary inductors affecting the spatial distribution of the plasma.

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