LITHOGRAPHY APPARATUS
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Abstract
A lithography apparatus comprises a structural element, a sensor having a detection region for detecting a physical quantity in at least one detection direction with respect to the structural element, and a sensor receptacle for mounting the sensor to the structural element, wherein the sensor is arranged in such a way that the maximum displacement of the detection region in the detection direction relative to the structural element is not greater than the maximum displacement of the detection region in the detection direction in the case of an arrangement of the sensor orthogonally with respect thereto.
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Citations
36 Claims
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1-16. -16. (canceled)
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17. An apparatus, comprising:
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a structural element; a sensor having a detection region configured to detect a physical quantity in a detection direction with respect to the structural element; and a sensor receptacle which mounts the sensor to the structural element, wherein; the sensor is an arrangement so that, upon a change in a temperature of the sensor receptacle, a maximum displacement of the detection region in the detection direction is not greater than what a maximum displacement of the detection region in the detection direction would be if the sensor were in an orthogonal arrangement; a coefficient of thermal expansion of the sensor receptacle is different from a coefficient of thermal expansion of the structural element; and the apparatus is a lithography apparatus. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34)
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35. An apparatus, comprising:
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a structural element; a sensor having a detection region configured to detect a physical quantity in a detection direction with respect to the structural element; and a sensor receptacle which mounts the sensor to the structural element, wherein; the sensor is in an arrangement so that upon a change in a temperature of the sensor receptacle, a maximum displacement of the detection region in the detection direction is; not greater than what a maximum displacement of the detection region in the detection direction would be if the sensor were in an orthogonal arrangement; and less than what a maximum displacement in the detection direction would be if the sensor were in a rotated arrangement; and the apparatus is a lithography apparatus.
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36. An apparatus, comprising:
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a structural element; a sensor having a detection region configured to detect a physical quantity in a detection direction with respect to the structural element; and a sensor receptacle which mounts the sensor to the structural element, wherein; the sensor is an arrangement so that, upon a change in a temperature of the sensor receptacle, a maximum displacement of the detection region in the detection direction is not greater than what a maximum displacement of the detection region in the detection direction would be if the sensor were in an orthogonal arrangement; the sensor is configured to detect a physical quantity in two detection directions; the sensor is arranged at a position of the sensor receptacle; upon a change in the temperature by a predetermined temperature change value, the position of the sensor receptacle is not displaced in any direction by more than a predetermined absolute value of expansion relative to the structural element; and the apparatus is a lithography apparatus.
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Specification