×

Carbon Molecular Sieve Membrane (CMSM) Performance Tuning By Dual Temperature Secondary Oxygen Doping (DTSOD)

  • US 20140000454A1
  • Filed: 05/30/2013
  • Published: 01/02/2014
  • Est. Priority Date: 05/30/2012
  • Status: Active Grant
First Claim
Patent Images

1. A process for forming a carbon membrane comprising:

  • subjecting a polymer precursor membrane to a base pyrolysis temperature (BPT) in a very low oxygen environment (VLOE);

    thensubjecting the polymer precursor membrane to a second temperature (SHT) step in a higher oxygen environment (HOE), wherein the second temperature is higher than the BPT

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×