INTEGRATED CIRCUIT DEVICE FEATURING AN ANTIFUSE AND METHOD OF MAKING SAME
First Claim
1. An integrated circuit, comprising:
- an access transistor including at least one source/drain region; and
an antifuse having a conductor-insulator-conductor structure, the antifuse including a first conductor that is a first electrode, an antifuse dielectric, and a second conductor, wherein a first surface of the first electrode is coupled to a first surface of the antifuse dielectric, a second surface of the antifuse dielectric is coupled to a first surface of the second conductor, and the second conductor is electrically coupled to the access transistor'"'"'s source/drain region.
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Accused Products
Abstract
One feature pertains to an integrated circuit, comprising an access transistor and an antifuse. The access transistor includes at least one source/drain region, and the antifuse has a conductor-insulator-conductor structure. The antifuse includes a first conductor that acts as a first electrode, and also includes an antifuse dielectric, and a second conductor. A first surface of the first electrode is coupled to a first surface of the antifuse dielectric, a second surface of the antifuse dielectric is coupled to a first surface of the second conductor. The second conductor is electrically coupled to the access transistor'"'"'s source/drain region. The antifuse is adapted to transition from an open circuit state to a closed circuit state if a programming voltage Vpp greater than or equal to an antifuse dielectric breakdown voltage is applied between the first electrode and the second conductor.
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Citations
43 Claims
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1. An integrated circuit, comprising:
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an access transistor including at least one source/drain region; and an antifuse having a conductor-insulator-conductor structure, the antifuse including a first conductor that is a first electrode, an antifuse dielectric, and a second conductor, wherein a first surface of the first electrode is coupled to a first surface of the antifuse dielectric, a second surface of the antifuse dielectric is coupled to a first surface of the second conductor, and the second conductor is electrically coupled to the access transistor'"'"'s source/drain region. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A method of manufacturing an integrated circuit, the method comprising:
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providing a substrate; forming an access transistor including at least one source/drain region in the substrate; providing a first conductor to form a first electrode; providing an antifuse dielectric; providing a second conductor; forming an antifuse by coupling a first surface of the first electrode to a first surface of the antifuse dielectric, and coupling a second surface of the antifuse dielectric to a first surface of the second conductor; and electrically coupling the second conductor to the access transistor'"'"'s source/drain region. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33)
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34. An integrated circuit, comprising:
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an access transistor including at least one source/drain region; and an antifuse having a conductor-insulator-conductor structure, the antifuse including a first means for conducting, a means for insulating, and a second means for conducting, wherein a first surface of the first means for conducting is coupled to a first surface of the means for insulating, a second surface of the means for insulating is coupled to a first surface of the second means for conducting, and the second means for conducting is electrically coupled to the access transistor'"'"'s source/drain region. - View Dependent Claims (35, 36, 37, 38, 39, 40, 41, 42, 43)
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Specification