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RESIST UNDERLAYER FILM FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME

  • US 20140004465A1
  • Filed: 03/08/2012
  • Published: 01/02/2014
  • Est. Priority Date: 03/15/2011
  • Status: Active Grant
First Claim
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1. A resist underlayer film forming composition for lithography, comprising:

  • a polymer including a structure of formula (1) below at a terminal of a polymer chain;

    a cross-linking agent;

    a compound that promotes a cross-linking reaction; and

    an organic solvent;

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