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SYSTEM AND METHOD FOR HIGH RESOLUTION, HIGH THROUGHPUT PROCESSING OF CONDUCTIVE PATTERNS OF FLEXIBLE SUBSTRATES

  • US 20140013566A1
  • Filed: 05/31/2013
  • Published: 01/16/2014
  • Est. Priority Date: 07/10/2012
  • Status: Active Grant
First Claim
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1. An alignment feedback apparatus for aligning multiple substrate layers, the apparatus comprising:

  • a. a first substrate layer having a first portion of an alignment target area formed on a surface, wherein the first portion of the alignment target area includes a first manual alignment marker and a first machine alignment marker; and

    b. a second substrate layer having a second portion of the alignment target area formed on a surface, the second substrate layer coupled to the first substrate layer,wherein the second portion of the alignment target area includes a second manual alignment marker and a second machine alignment marker, wherein when the first substrate layer and the second substrate layer are properly aligned with each other, the first manual alignment marker is aligned with the second manual alignment marker, and the first machine alignment marker is aligned with the second machine alignment marker.

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