GAS-LIQUID PHASE TRANSITION METHOD AND APPARATUS FOR CLEANING OF SURFACES IN SEMICONDUCTOR MANUFACTURING
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Abstract
A method and apparatus for cleaning an article in semiconductor manufacturing are provided. The method includes subjecting a first chamber containing the article to a vapor source while controlling a temperature of the article and a temperature of the vapor source such that vapor from the vapor source condenses on a surface of the article to form a liquid film. The method further includes evaporating the liquid film, whereby the evaporating liquid transports contaminants from the surface of the article. Evaporating includes exposing the first chamber to condensing surfaces having a temperature lower than a temperature of the article, whereby the evaporated liquid condenses on the condensing surfaces. The apparatus includes a first chamber for housing the article, a vapor source connected to the first chamber, a temperature controller, and a second chamber connected with the first chamber to collect the vapor evaporated from the article.
29 Citations
95 Claims
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1-75. -75. (canceled)
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76. A method of cleaning an article, comprising:
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(a) subjecting a first chamber containing the article having contaminants on a surface of the article to a vapor source while controlling a temperature of the article and a temperature of the vapor source relative to one another such that vapor from the vapor source condenses on the surface to form a liquid film; and (b) evaporating the liquid film, whereby the evaporating liquid transports at least a portion of the contaminants away from the surface, wherein the evaporating comprises exposing the first chamber to one or more condensing surfaces having a temperature lower than a temperature of the article, whereby the evaporated liquid condenses on the condensing surfaces. - View Dependent Claims (77, 78, 79, 80, 81, 82, 83, 84, 85, 86, 87, 88, 89, 90, 91, 92, 93)
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94. A apparatus for cleaning an article, comprising:
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a first chamber configured for housing the article having contaminants on a surface of the article; a vapor source connected to the first chamber via a first valve; a temperature controller configured to control a temperature of the article and a temperature of the vapor source relative to one another such that vapor from the vapor source condenses on a surface of the article to form a liquid film; and a second chamber connected with the first chamber via a second valve, and configured to collect vapor evaporated from the article so as to transport contaminants away from the surface of the article. - View Dependent Claims (95)
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Specification