LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME
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Accused Products
Abstract
Provided is a method to manufacture a liquid crystal display device in which a contact hole for the electrical connection of the pixel electrode and one of the source and drain electrode of a transistor and a contact hole for the processing of a semiconductor layer are formed simultaneously. The method contributes to the reduction of a photography step. The transistor includes an oxide semiconductor layer where a channel formation region is formed.
22 Citations
26 Claims
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1. (canceled)
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2. A method for manufacturing a liquid crystal display device, the method comprising:
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forming a gate electrode over a substrate; forming a gate insulating layer over the gate electrode; forming an oxide semiconductor layer over the gate insulating layer; forming a source electrode and a drain electrode over the oxide semiconductor layer; forming an insulating layer over the source electrode, the drain electrode, and the oxide semiconductor layer; forming a first contact hole in the insulating layer to expose part of one of the source electrode and the drain electrode; and forming a pixel electrode over the first contact hole. - View Dependent Claims (3, 4, 5, 6, 7, 8, 9)
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10. A method for manufacturing a liquid crystal display device, the method comprising:
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forming a separation layer over a substrate; forming a gate electrode over the separation layer; forming a gate insulating layer over the gate electrode; forming a oxide semiconductor layer over the gate insulating layer; forming a source electrode and a drain electrode over the oxide semiconductor layer; forming an insulating layer over the source electrode, the drain electrode, and the oxide semiconductor layer; forming a first contact hole in the insulating layer to expose part of one of the source electrode and the drain electrode; forming a pixel electrode over the first contact hole; and separating the gate electrode, the gate insulating layer, the oxide semiconductor layer, the source electrode, the drain electrode, the insulating layer, and the pixel electrode from the substrate. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17)
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18. A method for manufacturing a liquid crystal display device, the method comprising:
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forming a gate electrode over a substrate; forming a gate insulating layer over the gate electrode; forming a first oxide semiconductor layer over the gate insulating layer; forming a second oxide semiconductor layer over the first oxide semiconductor layer; forming a source electrode and a drain electrode over the second oxide semiconductor layer; forming an insulating layer over the source electrode, the drain electrode, and the second oxide semiconductor layer; forming a first contact hole in the insulating layer to expose part of one of the source electrode and the drain electrode; and forming a pixel electrode over the first contact hole. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26)
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Specification