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METHOD OF COATING WATER SOLUBLE MASK FOR LASER SCRIBING AND PLASMA ETCH

  • US 20140017882A1
  • Filed: 06/13/2013
  • Published: 01/16/2014
  • Est. Priority Date: 07/13/2012
  • Status: Active Grant
First Claim
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1. A method of dicing a semiconductor wafer comprising a plurality of integrated circuits, the method comprising:

  • forming a hybrid mask above the semiconductor wafer, the hybrid mask comprising a first water-soluble layer disposed on the integrated circuits, and a second water-soluble layer disposed on the first water-soluble layer;

    patterning the hybrid mask with a laser scribing process to provide a patterned hybrid mask with gaps, exposing regions of the semiconductor wafer between the integrated circuits; and

    etching the semiconductor wafer through the gaps in the patterned hybrid mask to singulate the integrated circuits.

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