ADJUSTABLE SLOT ANTENNA FOR CONTROL OF UNIFORMITY IN A SURFACE WAVE PLASMA SOURCE
First Claim
1. A surface wave plasma source (SWPS), comprising:
- an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface located adjacent said plasma, said EM wave launcher comprising a slot antenna having a plurality of antenna slots formed therethrough configured to couple said EM energy from a first region above said slot antenna to a second region below said slot antenna;
a dielectric window positioned in said second region and having a lower surface of said dielectric window including said plasma surface;
a slotted gate plate arranged parallel with said slot antenna and configured to be movable relative to said slot antenna between variable opacity positions including a first opaque position in which at least one first gate slot is misaligned with a first arrangement of antenna slots in said plurality of antenna slots to prevent said EM energy from passing through said first arrangements of antenna slots, and a first transparent position in which said at least one first gate slot is aligned with said first arrangement of antenna slots to allow a full intensity of said EM energy to pass through said first arrangement of antenna slots; and
a power coupling system coupled to said EM wave launcher and configured to provide said EM energy to said EM wave launcher for forming said plasma.
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Abstract
The present invention provides a surface wave plasma source including an electromagnetic (EM) wave launcher comprising a slot antenna having a plurality of antenna slots configured to couple the EM energy from a first region above the slot antenna to a second region below the slot antenna, and a power coupling system is coupled to the EM wave launcher. A dielectric window is positioned in the second region and has a lower surface including the plasma surface. A slotted gate plate is arranged parallel with the slot antenna and is configured to be movable relative to the slot antenna between variable opacity positions including a first opaque position to prevent the EM energy from passing through the first arrangements of antenna slots, and a first transparent position to allow a full intensity of the EM energy to pass through the first arrangement of antenna slots.
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Citations
20 Claims
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1. A surface wave plasma source (SWPS), comprising:
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an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface located adjacent said plasma, said EM wave launcher comprising a slot antenna having a plurality of antenna slots formed therethrough configured to couple said EM energy from a first region above said slot antenna to a second region below said slot antenna; a dielectric window positioned in said second region and having a lower surface of said dielectric window including said plasma surface; a slotted gate plate arranged parallel with said slot antenna and configured to be movable relative to said slot antenna between variable opacity positions including a first opaque position in which at least one first gate slot is misaligned with a first arrangement of antenna slots in said plurality of antenna slots to prevent said EM energy from passing through said first arrangements of antenna slots, and a first transparent position in which said at least one first gate slot is aligned with said first arrangement of antenna slots to allow a full intensity of said EM energy to pass through said first arrangement of antenna slots; and a power coupling system coupled to said EM wave launcher and configured to provide said EM energy to said EM wave launcher for forming said plasma. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method for controlling plasma properties in a surface wave plasma source (SWPS) having an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface located adjacent said plasma, said EM wave launcher comprising a slot antenna having a plurality of antenna slots formed therethrough configured to couple said EM energy from a first region above said slot antenna to a second region below said slot antenna;
- a dielectric window positioned in said second region having a lower surface including said plasma surface; and
a power coupling system coupled to said EM wave launcher and configured to provide said EM energy to said EM wave launcher for forming said plasma, the method comprising;controlling a plasma property by changing an orientation of a slotted gate plate with respect to said slot antenna, wherein said slotted gate plate is parallel with said slot antenna and configured to be movable relative to said slot antenna between variable opacity positions including a first opaque position in which at least one first gate slot is misaligned with a first arrangement of antenna slots in said plurality of antenna slots to prevent said EM energy from passing through said first arrangements of antenna slots, and a first transparent position in which said at least one first gate slot is aligned with said first arrangement of antenna slots to allow a full intensity of said EM energy to pass through said first arrangement of antenna slots. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20)
- a dielectric window positioned in said second region having a lower surface including said plasma surface; and
Specification