Semiconductor Devices and Methods of Manufacturing the Same
First Claim
1. A method of manufacturing a semiconductor device, comprising:
- forming a thin layer on a substrate including a first region and a second region;
forming a gate insulating layer on the thin layer;
doping nitrogen into a portion of the gate insulating layer and a portion of the thin layer disposed under the gate insulating layer in the second region; and
forming first and second gate structures in the first and second regions, respectively.
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Abstract
Methods of manufacturing a semiconductor device include forming a thin layer on a substrate including a first region and a second region and forming a gate insulating layer on the thin layer. A lower electrode layer is formed on the gate insulating layer and the lower electrode layer disposed in the second region is removed to expose the gate insulating layer in the second region. Nitrogen is doped into an exposed portion of the gate insulating layer and the thin layer disposed under the gate insulating layer. An upper electrode layer is formed on the lower electrode layer remaining in the first region and the exposed portion of the gate insulating layer. The upper electrode layer, the lower electrode layer, the gate insulating layer and the thin layer are partially removed to form first and second gate structures in the first and second regions. The process may be simplified.
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Citations
20 Claims
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1. A method of manufacturing a semiconductor device, comprising:
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forming a thin layer on a substrate including a first region and a second region; forming a gate insulating layer on the thin layer; doping nitrogen into a portion of the gate insulating layer and a portion of the thin layer disposed under the gate insulating layer in the second region; and forming first and second gate structures in the first and second regions, respectively. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A semiconductor device, comprising:
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a semiconductor substrate comprising a first region and a second region; a PMOS transistor including a first gate structure and a first impurity region, a first gate structure being disposed in the first region of the substrate, the first gate structure including a first thin layer pattern, a first gate insulating layer pattern, a lower gate electrode and a first upper gate electrode, the first impurity region being formed at an upper portion of the substrate near the first gate structure; and a NMOS transistor including a second gate structure and a second impurity region, the second gate structure being disposed in the second region of the substrate, the second gate structure including a second thin layer pattern, a second gate insulating layer pattern and a second upper gate electrode, the second impurity region being formed at the upper portion of the substrate near the second gate structure, wherein the first thin layer pattern includes a first nitrogen concentration and the and the second thin layer pattern includes a second nitrogen concentration that is greater than the first nitrogen concentration. - View Dependent Claims (18, 19, 20)
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Specification