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Semiconductor Devices and Methods of Manufacturing the Same

  • US 20140035058A1
  • Filed: 07/12/2013
  • Published: 02/06/2014
  • Est. Priority Date: 07/31/2012
  • Status: Abandoned Application
First Claim
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1. A method of manufacturing a semiconductor device, comprising:

  • forming a thin layer on a substrate including a first region and a second region;

    forming a gate insulating layer on the thin layer;

    doping nitrogen into a portion of the gate insulating layer and a portion of the thin layer disposed under the gate insulating layer in the second region; and

    forming first and second gate structures in the first and second regions, respectively.

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